H01J 61/28
Means for producing, introducing, or replenishing gas or vapour during operation of
Official title: Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
H01J61/28 (Means for producing, introducing, or replenishing gas or vapour during operation of) appears on 215 US grants and 155 published applications in this corpus.
Search patents in H01J- Granted patents
- 215
- Published applications
- 155
- Assignees
- 82
- Inventors
- 492
- Latest grant
- 11 Mar 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 3 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 3 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 4 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 3 | 0 |
| 1990 | 6 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 5 | 0 |
| 1996 | 3 | 0 |
| 1997 | 5 | 0 |
| 1998 | 12 | 0 |
| 1999 | 8 | 0 |
| 2000 | 4 | 0 |
| 2001 | 9 | 2 |
| 2002 | 6 | 8 |
| 2003 | 8 | 5 |
| 2004 | 9 | 7 |
| 2005 | 5 | 4 |
| 2006 | 7 | 9 |
| 2007 | 4 | 6 |
| 2008 | 2 | 0 |
| 2009 | 3 | 17 |
| 2010 | 6 | 8 |
| 2011 | 13 | 11 |
| 2012 | 4 | 4 |
| 2013 | 10 | 14 |
| 2014 | 8 | 22 |
| 2015 | 5 | 4 |
| 2016 | 10 | 2 |
| 2017 | 1 | 4 |
| 2018 | 5 | 3 |
| 2019 | 4 | 3 |
| 2020 | 5 | 3 |
| 2021 | 2 | 5 |
| 2022 | 5 | 4 |
| 2023 | 4 | 6 |
| 2024 | 4 | 0 |
| 2025 | 1 | 1 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Light-emitting gas recovery method and light-emitting gas recovery apparatus11 Mar 2025US 12,249,500 B1Ushio Denki Kabushiki Kaisha
- Reducing fretting corrosion in a gas discharge chamber support device22 Oct 2024US 12,125,695 B2Cymer, Inc.
- Arc lamp with forming gas for thermal processing systems15 Oct 2024US 12,119,216 B2Beijing E-Town Semiconductor Technology Co., Ltd.
- Laser-sustained plasma source based on colliding liquid jets9 Jul 2024US 12,033,845 B2KLA Corporation
- Swirler for laser-sustained plasma light source with reverse vortex flow7 May 2024US 11,978,620 B2KLA Corporation
- Spectral range extension for laser-sustained plasma light collection28 May 2026US 2026/0148951 A1KLA Corporation
- Vuv laser-sustained plasma light source with direct gas flow28 May 2026US 2026/0148952 A1KLA Corporation
- Refillable lamp for laser sustained plasma light source28 May 2026US 2026/0148953 A1KLA Corporation
- Light-emitting gas recovery method and light-emitting gas recovery apparatus6 Mar 2025US 2025/0079147 A1Ushio Denki Kabushiki Kaisha
- Arc Lamp With Forming Gas For Thermal Processing Systems2 Nov 2023US 2023/0352294 A1Beijing E-Town Semiconductor Technology Co., Ltd.
Most cited
By later US patents
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Configurations, materials and wavelengths for EUV lithium plasma discharge lamps76US 5,963,616 AUniversity of Central Florida · 1999
- UV radiation source for densification of CVD carbon-doped silicon oxide films72US 6,614,181 B1APPLIED Materials.Inc. · 2003
- Electrodeless fluorescent lamp with an electrically conductive coating46US 5,808,414 AGeneral Electric Company · 1998
- Electrodeless fluorescent lamp with optimized amalgam positioning35US 5,434,482 AGeneral Electric Company · 1995