H01J 27/04
Using reflex discharge
Official title: using reflex discharge, e.g. Penning ion sources {(electron bombardment ion sources H01J27/08)}
H01J27/04 (Using reflex discharge) appears on 71 US grants and 31 published applications in this corpus.
Search patents in H01J- Granted patents
- 71
- Published applications
- 31
- Assignees
- 53
- Inventors
- 125
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 7 | 0 |
| 2000 | 5 | 0 |
| 2001 | 3 | 1 |
| 2002 | 0 | 5 |
| 2003 | 7 | 3 |
| 2004 | 0 | 1 |
| 2005 | 2 | 1 |
| 2006 | 1 | 1 |
| 2007 | 1 | 3 |
| 2008 | 2 | 0 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 0 | 0 |
| 2014 | 0 | 3 |
| 2015 | 1 | 1 |
| 2016 | 3 | 0 |
| 2017 | 0 | 2 |
| 2018 | 0 | 1 |
| 2019 | 4 | 2 |
| 2020 | 1 | 0 |
| 2021 | 1 | 1 |
| 2022 | 2 | 3 |
| 2023 | 0 | 0 |
| 2024 | 2 | 1 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Ion milling apparatus16 Jun 2026US 12,658,399 B2Hitachi High-Tech Corporation
- Ion gun and ion milling machine30 Jul 2024US 12,051,560 B2Hitachi High-Tech Corporation
- Ion generation apparatus and ion mobility analysis apparatus21 May 2024US 11,988,634 B2Sharp Kabushiki Kaisha
- Sputter ion pump with penning-trap current sensor29 Mar 2022US 11,289,315 B1ColdQuanta, Inc.
- Ion milling apparatus22 Feb 2022US 11,257,654 B2Hitachi High-Tech Corporation
- Ion Milling Apparatus1 Aug 2024US 2024/0258062 A1Hitachi High-Tech Corporation
- Ion gun and ion milling machine8 Sep 2022US 2022/0285123 A1Hitachi High-Tech Corporation
- Ion generation apparatus and ion mobility analysis apparatus9 Jun 2022US 2022/0178876 A1Sharp Kabushiki Kaisha
- Sputter ion pump with penning-trap current sensor2 Jun 2022US 2022/0172935 A1ColdQuanta, Inc.
- Ion milling apparatus16 Sep 2021US 2021/0287871 A1Hitachi High-Technologies Corporation
Most cited
By later US patents
- Metastable atom bombardment source93US 6,124,675 AUniversity of Montreal · 2000
- Plasma gun and methods for the use thereof73US 5,866,871 A1999
- Boron ion sources for ion implantation apparatus68US 5,977,552 AAPPLIED Materials.Inc. · 1999
- Intense ion beam generation with an inverse reflex tetrode (IRT)49US 4,282,436 AThe United States of America as represented by the Secretary of the Navy · 1981
- Method for in-process cleaning of an ion source48US 6,135,128 AEaton Corporation · 2000