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US 2021/0287871 A1Published application
Ion milling apparatus
AssigneeHitachi High-Technologies Corporation
InventorsKengo ASAI, Hiroyasu SHICHI, Toru IWAYA, Hisayuki TAKASU
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Abstract
To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.
Claims13
An ion milling apparatus comprising:
- an ion gun containing therein a beam forming electrode for forming an ion beam;
- a specimen holder for fixing a specimen to be processed by irradiation of the ion beam;
- a mask for shielding a part of the specimen from the ion beam;
- and
- an ion gun controller for controlling the ion gun.
2 more elements
An ion milling apparatus comprising:
- an ion gun containing therein a beam forming electrode for forming an ion beam;
- a specimen holder for fixing a specimen to be processed by irradiation of the ion beam;
- a mask for shielding a part of the specimen from the ion beam;
- an electron microscope column for radiating an electron beam;
- and
- an ion gun controller for controlling the ion gun.
3 more elements
Dependencies are inferred from the claim text.