G05B 2219/32244
By using graphical display of array and selecting elements, rearrange them
G05B2219/32244 (By using graphical display of array and selecting elements, rearrange them) appears on 11 US grants and 6 published applications in this corpus.
Search patents in G05B- Granted patents
- 11
- Published applications
- 6
- Assignees
- 13
- Inventors
- 32
- Latest grant
- 20 Dec 2011
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 1 | 0 |
| 2006 | 2 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 3 |
| 2009 | 2 | 0 |
| 2010 | 1 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Substrate processing recipe manager20 Dec 2011US 8,082,045 B1Intermolecular, Inc.
- Substrate processing system, and method of control therefor, control program, and storage medium1 Jun 2010US 7,729,798 B2Tokyo Electron Limited
- Automated sputtering target production14 Jul 2009US 7,561,937 B2Tosoh SMD, Inc.
- Automated sputtering target production and sub systems thereof27 Jan 2009US 7,480,976 B2Tosoh SMD ETNA, LLC
- Lot start agent that determines delta virtual WIP time for each bottleneck station in a multi-product and multi-bottleneck manufacturing environment30 May 2006US 7,054,702 B1Advanced Micro Devices, Inc.
- Systems and methods for dynamically customizing a human-machine interface using object oriented programming22 Jun 2023US 2023/0195084 A1Atom design Inc.
- Automated Sputtering Target Production6 Nov 2008US 2008/0271305 A1Tosoh SMD ETNA, LLC
- Automated Sputtering Target Production11 Sep 2008US 2008/0221721 A1Tosoh SMD ETNA, LLC
- Automated Sputtering Target Production and Sub Systems Thereof15 May 2008US 2008/0110011 A1Tosoh SMD ETNA, LLC
- Substrated processing system, and method of control therefor, control program and storage medium12 Oct 2006US 2006/0228195 A1Tokyo Electron Limited
Most cited
By later US patents
- Data structure for use in enterprise controls170US 6,268,853 B1Rockwell Technologies, LLC · 2001
- Method and systems for a graphical real time flow task scheduler33US 6,323,882 B1Simulation Sciences, Inc. · 2001
- Scheduling system28US 5,487,144 AYokogawa Electric Corporation · 1996
- Substrate processing system, and method of control therefor, control program, and storage medium14US 7,729,798 B2Tokyo Electron Limited · 2010
- Method and systems for a graphical real time flow task scheduler13US 6,941,519 B1Invensys Systems, Inc. · 2005