G03B 27/70
Reflectors in printing beam
G03B27/70 (Reflectors in printing beam) appears on 29 US grants and 12 published applications in this corpus.
Search patents in G03B- Granted patents
- 29
- Published applications
- 12
- Assignees
- 17
- Inventors
- 51
- Latest grant
- 16 Feb 2021
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 4 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 2 |
| 2009 | 0 | 1 |
| 2010 | 1 | 4 |
| 2011 | 3 | 0 |
| 2012 | 1 | 1 |
| 2013 | 2 | 1 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
| 2020 | 1 | 2 |
| 2021 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Reserving spatial light modulator sections to address field non-uniformities16 Feb 2021US 10,921,714 B2APPLIED Materials.Inc.
- Reserving spatial light modulator sections to address field non-uniformities7 Jul 2020US 10,705,433 B2APPLIED Materials.Inc.
- Reserving spatial light modulator sections to address field non-uniformities10 Dec 2019US 10,503,076 B1APPLIED Materials.Inc.
- Maskless vortex phase shift optical direct write lithography17 Nov 2015US 9,188,848 B2Avago Technologies General IP (Singapore) Pte. Ltd.
- Exposure apparatus and method of manufacturing device4 Jun 2013US 8,456,612 B2Canon Kabushiki Kaisha
- Reserving spatial light modulator sections to address field non-uniformities24 Sep 2020US 2020/0301288 A1APPLIED Materials.Inc.
- Reserving spatial light modulator sections to address field non-uniformities5 Mar 2020US 2020/0073253 A1APPLIED Materials.Inc.
- Maskless Vortex Phase Shift Optical Direct Write Lithography2 May 2013US 2013/0107240 A1LSI Corporation
- Maskless Vortex Phase Shift Optical Direct Write Lithography16 Feb 2012US 2012/0038896 A1LSI Corporation
- Exposure apparatus and method of manufacturing device2 Dec 2010US 2010/0302517 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Optical system for printing normal and panoramic images22US 5,486,895 AEastman Kodak Company · 1996
- Method of setting color copying conditions19US 4,860,059 AFuji Photo Film Co., Ltd. · 1989
- Apparatus and method for scanning a bound document using a wedge shaped platen with a moving mirror17US 5,636,006 AXerox Corporation · 1997
- Color printing control system and method13US 4,657,378 AHope Industries, Inc. · 1987
- Optical arrangement especially suitable for use in a high speed multi-magnification photofinishing printer10US 5,220,378 AEastman Kodak Company · 1993