Maskless vortex phase shift optical direct write lithography
AssigneeAvago Technologies General IP (Singapore) Pte. Ltd.
InventorsNicholas K. Eib, Ebo H. Croffie, Neal P. Callan
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Abstract
The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems facilitate pattern transfer using such vortex phase shift exposure patterns.
Claims23
A maskless lithography system for patterning a substrate having a layer of photoimageable material formed thereon, the system comprising:
- a mirror array comprising a plurality of movable mirrors arranged in a plurality of tiles configured in vortex phase shift optical patterns enabling the generation of corresponding vortex phase shift exposure patterns;
- an illumination source arranged to direct light onto the mirror array to generate the respective vortex phase shift exposure patterns;
- optics configured to project the vortex phase shift exposure patterns onto a substrate;
- and
- a stage for holding the substrate to facilitate exposure of at least a portion of the substrate to the vortex phase shift optical patterns.
A maskless lithography system, comprising:
- a mirror array comprising a plurality of movable mirrors configurable as a plurality of tiles arranged in a phase shift optical pattern that each generate a vortex phase shift exposure pattern when illuminated;
- a control element for reconfiguring the plurality of mirrors to generate a desired vortex phase shift optical pattern for each tile;
- an illumination source operative for directing light onto the mirror array to generate the vortex phase shift exposure patterns that are projected onto a substrate;
- and
- a stage operative to move the substrate to facilitate exposure of at least a portion of the substrate to the vortex phase shift exposure pattern.
The maskless lithography system of 21, wherein for a given amount of illumination energy the first vortex phase shift optical pattern generates a smaller dark spot than a dark spot produced by the second vortex phase shift optical pattern.
Dependencies are inferred from the claim text.