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AssigneeApplied Materials, Inc.
InventorsJoseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher
Estimating the term…
Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
A method for patterning a substrate using a spatial light modulator, wherein the spatial light modulator comprises a plurality of light emitters, the method comprising:
A non-transitory computer-readable medium having instructions that are configured to cause a system to:
A spatial light modulator for patterning a substrate, comprising:
Dependencies are inferred from the claim text.