Reserving spatial light modulator sections to address field non-uniformities

A method for patterning a substrate using a digital micromirror device, wherein the digital micromirror device comprises an array of micromirrors arranged in a plurality of columns and rows, the method comprising:

• scanning the substrate with the digital micromirror device, the scanning the substrate with the digital micromirror device comprising a movement of a distance W in a position of the substrate;
• evaluating a uniformity of the patterned substrate;
• identifying an area of non-uniformity of the patterned substrate;
• designating a subset of the plurality of columns of micromirrors for attenuation, wherein a number of columns in the subset of the plurality of columns of micromirrors is equal to a number of columns of micromirrors in the distance W rounded down to the nearest integer;
• turning off the designated subset of the plurality of columns of micromirrors;
• and
• scanning the substrate with the digital micromirror device.

A method for patterning a substrate using a digital micromirror device, wherein the digital micromirror device comprises an array of micromirrors arranged in a plurality of columns and rows, the method comprising:

• scanning the substrate with the digital micromirror device, wherein a subset of the plurality of columns of the digital micromirror device are turned off during the scanning;
• evaluating a uniformity of the patterned substrate;
• identifying an area of non-uniformity of the patterned substrate;
• designating a subset of the plurality of columns of micromirrors for assist;
• turning on the designated subset of the plurality of columns of micromirrors for a period of time, the period of time comprising a time required for the digital micromirror device to scan across the area of non-uniformity of the patterned substrate;
• and
• scanning the substrate with the digital micromirror device.

A method for patterning a substrate using a digital micromirror device, wherein the digital micromirror device comprises an array of micromirrors arranged in a plurality of columns and rows, the method comprising:

• scanning the substrate with the digital micromirror device, wherein a subset of the plurality of columns of the digital micromirror device are turned off during the scanning, and the scanning the substrate with the digital micromirror device comprises a shift of a distance W in a position of the substrate;
• evaluating a uniformity of the patterned substrate;
• identifying an area of non-uniformity of the patterned substrate;
• designating a subset of the plurality of columns of micromirrors for assist, wherein a number of columns in the subset of the plurality of columns of micromirrors is equal to a number of columns of micromirrors in the distance W rounded down to the nearest integer;
• turning on the designated subset of the plurality of columns of micromirrors;
• and
• scanning the substrate with the digital micromirror device.

A digital micromirror device for patterning a substrate, comprising:

• an array of micromirrors arranged in a plurality of columns and rows of micromirrors, wherein a number of the plurality of columns and rows of micromirrors is configured to be activated or deactivated as a unit;
• wherein the digital micromirror device is in communication with a controller configured to:
• identify an area of non-uniformity of the patterned substrate;
• and
• designate a subset of the number of the plurality of columns and rows of micromirrors to be activated or deactivated as a unit, and the subset of the number of the plurality of columns of micromirrors is determined by:
• dividing a total number of columns of micromirrors in the plurality of columns of micromirrors by a number of exposures in a scan of the digital micromirror device;
• and
• rounding down to the nearest integer.

A digital micromirror device for patterning a substrate, comprising:

• an array of micromirrors arranged in a plurality of columns and rows of micromirrors, wherein a number of the plurality of columns and rows of micromirrors is configured to be activated or deactivated as a unit;
• wherein the digital micromirror device is in communication with a controller configured to:
• identify an area of non-uniformity of the patterned substrate;
• and
• designate a subset of the number of the plurality of columns and rows of micromirrors to be activated or deactivated as a unit, and the subset of the number of the plurality of columns and rows of micromirrors is activated or deactivated as a unit for a period of time, the period of time comprising a time required for the digital micromirror device to scan across the area of non-uniformity of the patterned substrate.