Exposure apparatus and method of manufacturing device

An exposure apparatus that projects a pattern of an original onto a substrate by a projection optical system to expose the substrate,

• the projection optical system comprising a mirror assembly including a first mirror member having a first reflecting surface which bends a light passing through the projection optical system, a second mirror member having a second reflecting surface which bends the light, and a supporting mechanism having a first supporting surface which supports the first mirror member and a second supporting surface which supports the second mirror member, the supporting mechanism being positioned so as to position the first mirror member and the second mirror member while a positional relationship between the first mirror member and the second mirror member is maintained,
• the apparatus comprising an adjustment mechanism configured to adjust an angle of the first reflecting surface of the first mirror member and the second reflecting surface of the second mirror member,
• wherein the first mirror member has a first supported point between a plane to which the first reflecting surface belongs and a plane to which a first lower surface opposite to the first reflecting surface belongs, and is supported by the first supporting surface of the supporting mechanism at the first supported point,
• the second mirror member has a second supported point between a plane to which the second reflecting surface belongs and a plane to which a second lower surface opposite to the second reflecting surface belongs, and is supported by the second supporting surface of the supporting mechanism at the second supported point,
• the first mirror member has a first recess in a back side of the first reflecting surface, the first supported point being formed by a member fixed to an inner surface of the first recess, and
• the second mirror member has a second recess in a side of the second reflecting surface, the second supported point being formed by a member fixed to an inner surface of the second recess.

A method of manufacturing a device, the method comprising the steps of:

• exposing a substrate using an exposure apparatus;
• and
• developing the substrate,
• wherein the exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system to expose the substrate,
• the projection optical system comprising a mirror assembly including a first mirror member having a first reflecting surface which bends a light passing through the projection optical system, a second mirror member having a second reflecting surface which bends the light, and a supporting mechanism having a first supporting surface which supports the first mirror member and a second supporting surface which supports the second mirror member,
• the apparatus comprising an adjustment mechanism configured to adjust an angle of the first reflecting surface of the first mirror member and the second reflecting surface of the second mirror member,
• wherein the first mirror member is arranged such that the first reflecting surface is directed obliquely upward, the first mirror member having a first recess formed in a back side of the first reflecting surface, and a first supported point formed by a member fixed to an inner surface of the first recess,
• the second mirror member is arranged such that the second reflecting surface is directed obliquely downward, the second mirror member having a second recess formed in a side of the second reflecting surface, and a second supported point formed by a member fixed to an inner surface of the second recess,
• the first mirror member is supported by the first supporting surface of the supporting mechanism at the first supported point, and the second mirror member is supported by the second supporting surface of the supporting mechanism at the second supported point.

A method of manufacturing a device, the method comprising the steps of:

• exposing a substrate using an exposure apparatus;
• and
• developing the substrate,
• wherein the exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system to expose the substrate,
• the projection optical system comprising a mirror assembly including a first mirror member having a first reflecting surface which bends a light passing through the projection optical system, a second mirror member having a second reflecting surface which bends the light, and a supporting mechanism having a first supporting surface which supports the first mirror member and a second supporting surface which supports the second mirror member, the supporting mechanism being positioned so as to position the first mirror member and the second mirror member while a positional relationship between the first mirror member and the second mirror member is maintained,
• the apparatus comprising an adjustment mechanism configured to adjust an angle of the first reflecting surface of the first mirror member and the second reflecting surface of the second mirror member,
• wherein the first mirror member has a first supported point between a plane to which the first reflecting surface belongs and a plane to which a first lower surface opposite to the first reflecting surface belongs, and is supported by the first supporting surface of the supporting mechanism at the first supported point,
• the second mirror member has a second supported point between a plane to which the second reflecting surface belongs and a plane to which a second lower surface opposite to the second reflecting surface belongs, and is supported by the second supporting surface of the supporting mechanism at the second supported point,
• the first mirror member has a first recess in a back side of the first reflecting surface, the first supported point being formed by a member fixed to an inner surface of the first recess, and
• the second mirror member has a second recess in a side of the second reflecting surface, the second supported point being formed by a member fixed to an inner surface of the second recess.