G03B 27/68
Introducing or correcting distortion
Official title: Introducing or correcting distortion, e.g. in connection with oblique projection
G03B27/68 (Introducing or correcting distortion) appears on 60 US grants and 41 published applications in this corpus.
Search patents in G03B- Granted patents
- 60
- Published applications
- 41
- Assignees
- 32
- Inventors
- 118
- Latest grant
- 9 Feb 2021
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 4 |
| 2003 | 5 | 3 |
| 2004 | 2 | 4 |
| 2005 | 6 | 2 |
| 2006 | 2 | 1 |
| 2007 | 1 | 2 |
| 2008 | 2 | 4 |
| 2009 | 0 | 6 |
| 2010 | 2 | 6 |
| 2011 | 1 | 2 |
| 2012 | 3 | 1 |
| 2013 | 3 | 1 |
| 2014 | 5 | 4 |
| 2015 | 2 | 0 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method and apparatus to correct for patterning process error9 Feb 2021US 10,915,689 B2ASML Netherlands B. V.
- Exposure apparatus and device manufacturing method3 Jan 2017US 9,535,335 B2Canon Kabushiki Kaisha
- Projector and display control method for projector with orientation correction12 Jul 2016US 9,389,493 B2Seiko Epson Corporation
- Non-uniform correction illumination pattern29 Sep 2015US 9,148,573 B2Hewlett-Packard Development Company, L. P.
- Lithographic apparatus, distortion determining method, and patterning device24 Mar 2015US 8,988,653 B2ASML Netherlands B. V.
- Method and apparatus to correct for patterning process error25 Oct 2018US 2018/0307135 A1ASML Netherlands B. V.
- Exposure apparatus and device manufacturing method16 Oct 2014US 2014/0307241 A1Canon Kabushiki Kaisha
- Non-uniform correction illumination pattern18 Sep 2014US 2014/0267866 A1Hewlett-Packard Development Company, L. P.
- Projector and display control method for projector12 Jun 2014US 2014/0160443 A1Seiko Epson Corporation
- Method and apparatus for composing 3d photographs20 Mar 2014US 2014/0079383 A13DV Co., Ltd.
Most cited
By later US patents
- Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure97US 6,078,380 ANikon Corporation · 2000
- Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate79US 6,577,379 B1Micron Technology, Inc. · 2003
- System and method for correcting multiple axis displacement distortion36US 7,352,913 B2Silicon Optix Inc. · 2008
- Liquid crystal projector35US 4,824,210 ACasio Computer Co., Ltd. · 1989
- Anamorphic focusing system18US 4,678,321 ARicoh Company, Ltd. · 1987