Exposure apparatus and device manufacturing method

A device manufacturing method comprising the steps of:

• exposing a substrate using an exposure apparatus;
• and
• developing the substrate,
• wherein the exposure apparatus projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate and comprises:
• a measurement unit configured to obtain a measurement value, and
• a controller configured to calculate a predicted deformation amount of the original and correct a projection magnification of the projection optical system so as to correct the predicted deformation amount, the predicted deformation amount of the original is calculated based on information representing a relationship between a deformation amount of the original with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light,
• wherein in the calculation of the predicted deformation amount of the original, the controller determines an elapsed time in the relationship, corresponding to the deformation amount of the original which is loaded into the chamber and unused for exposure based on the measurement value before exposure, and calculates the predicted deformation amount of the original based on the determined elapsed time in the relationship, the time for which the original receives the exposure light, and the information.

An exposure apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprising:

• a measurement unit configured to obtain a measurement value;
• and
• a controller configured to calculate a predicted deformation amount of the original and correct a projection magnification of the projection optical system so as to correct the predicted deformation amount, the predicted deformation amount of the original is calculated based on information representing a relationship between a deformation amount of the original with reference to a shape of the original at a certain temperature and a parameter having a correlation with the total amount of exposure energy accumulated in the original,
• wherein in the calculation of the predicted deformation amount of the original, the controller determines a value of the parameter in the relationship, the determined value of the parameter is corresponding to the deformation amount of the original which is loaded into the chamber and unused for exposure based on the measurement value before exposure, and calculates the predicted deformation amount of the original based on the determined value of the parameter, the arbitrary value of the parameter, and the information.