G01N 21/95607
Using a comparative method
Official title: {using a comparative method}
G01N21/95607 (Using a comparative method) appears on 1,120 US grants and 1,063 published applications in this corpus.
Search patents in G01N- Granted patents
- 1,120
- Published applications
- 1,063
- Assignees
- 364
- Inventors
- 2,124
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 4 | 0 |
| 1987 | 8 | 0 |
| 1988 | 10 | 0 |
| 1989 | 10 | 0 |
| 1990 | 11 | 0 |
| 1991 | 8 | 0 |
| 1992 | 12 | 0 |
| 1993 | 7 | 0 |
| 1994 | 4 | 0 |
| 1995 | 4 | 0 |
| 1996 | 7 | 0 |
| 1997 | 4 | 0 |
| 1998 | 18 | 0 |
| 1999 | 8 | 0 |
| 2000 | 22 | 0 |
| 2001 | 20 | 8 |
| 2002 | 21 | 34 |
| 2003 | 29 | 43 |
| 2004 | 31 | 54 |
| 2005 | 41 | 55 |
| 2006 | 51 | 45 |
| 2007 | 40 | 73 |
| 2008 | 52 | 73 |
| 2009 | 52 | 58 |
| 2010 | 63 | 38 |
| 2011 | 33 | 46 |
| 2012 | 40 | 40 |
| 2013 | 31 | 32 |
| 2014 | 36 | 37 |
| 2015 | 35 | 38 |
| 2016 | 30 | 31 |
| 2017 | 37 | 38 |
| 2018 | 28 | 38 |
| 2019 | 45 | 63 |
| 2020 | 63 | 53 |
| 2021 | 52 | 32 |
| 2022 | 23 | 46 |
| 2023 | 35 | 32 |
| 2024 | 32 | 18 |
| 2025 | 29 | 23 |
| 2026 | 18 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Deterioration estimation system, deterioration estimation method, and recording medium6 Oct 2026US 12,754,141 B2NEC Corporation
- Defect inspection method and defect inspection system15 Sep 2026US 12,736,480 B2Taiwan Semiconductor Manufacturing Company.Ltd
- RNA molecules, methods of producing circular RNA, and treatment methods15 Sep 2026US 12,737,877 B2Cornell University
- Method for detecting defects on wafers, system for detecting defects on wafers18 Aug 2026US 12,711,604 B2United Semiconductor (Xiamen) Co., Ltd.
- Time-domain optical metrology and inspection of semiconductor devices14 Jul 2026US 12,680,964 B2Nova Ltd.
- Camera-based sheet monitoring system8 Oct 2026US 2026/0309640 A1Honeywell International Inc.
- Method and system to for rapid inspection of photolithography reticle1 Oct 2026US 2026/0299405 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Inspection Method, Inspection Device, and Substrate Processing Device17 Sep 2026US 2026/0276559 A1Tokyo Electron Limited
- Pattern inspection apparatus and pattern inspection method10 Sep 2026US 2026/0268478 A1NuFlare Technology, Inc.
- Pattern inspection apparatus, focus position adjustment method, and pattern inspection method6 Aug 2026US 2026/0227344 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Automated photomask inspection apparatus and method277US 5,563,702 AKLA Instruments Corporation · 1996
- Inspection technique of photomask263US 6,091,845 AMicron Technology, Inc. · 2000
- Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems226US 4,805,123 AKLA Instruments Corporation · 1989
- Reticle inspection system212US 4,926,489 AKLA Instruments Corporation · 1990
- Automated photomask inspection apparatus211US 5,572,598 AKLA Instruments Corporation · 1996