G01N 2021/95615
With stored comparision signal
Official title: {with stored comparision signal}
G01N2021/95615 (With stored comparision signal) appears on 226 US grants and 223 published applications in this corpus.
Search patents in G01N- Granted patents
- 226
- Published applications
- 223
- Assignees
- 128
- Inventors
- 538
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 4 | 0 |
| 1989 | 4 | 0 |
| 1990 | 4 | 0 |
| 1991 | 5 | 0 |
| 1992 | 7 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 1 |
| 2002 | 4 | 4 |
| 2003 | 3 | 9 |
| 2004 | 3 | 11 |
| 2005 | 3 | 9 |
| 2006 | 11 | 5 |
| 2007 | 9 | 15 |
| 2008 | 13 | 21 |
| 2009 | 12 | 6 |
| 2010 | 8 | 6 |
| 2011 | 6 | 6 |
| 2012 | 5 | 9 |
| 2013 | 3 | 7 |
| 2014 | 5 | 10 |
| 2015 | 6 | 7 |
| 2016 | 11 | 6 |
| 2017 | 10 | 8 |
| 2018 | 7 | 5 |
| 2019 | 9 | 17 |
| 2020 | 13 | 13 |
| 2021 | 13 | 7 |
| 2022 | 1 | 12 |
| 2023 | 11 | 8 |
| 2024 | 15 | 9 |
| 2025 | 6 | 8 |
| 2026 | 7 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Defect inspection method and defect inspection system15 Sep 2026US 12,736,480 B2Taiwan Semiconductor Manufacturing Company.Ltd
- RNA molecules, methods of producing circular RNA, and treatment methods15 Sep 2026US 12,737,877 B2Cornell University
- Method for detecting defects on wafers, system for detecting defects on wafers18 Aug 2026US 12,711,604 B2United Semiconductor (Xiamen) Co., Ltd.
- Method and system to for rapid inspection of photolithography reticle23 Jun 2026US 12,663,711 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for processing decorative paper16 Jun 2026US 12,654,438 B2SWISS KRONO Tec AG
- Camera-based sheet monitoring system8 Oct 2026US 2026/0309640 A1Honeywell International Inc.
- Method and system to for rapid inspection of photolithography reticle1 Oct 2026US 2026/0299405 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Inspection Method, Inspection Device, and Substrate Processing Device17 Sep 2026US 2026/0276559 A1Tokyo Electron Limited
- Pattern inspection apparatus, focus position adjustment method, and pattern inspection method6 Aug 2026US 2026/0227344 A1NuFlare Technology, Inc.
- Battery housing cover welding system and point check method for same18 Sep 2025US 2025/0290870 A1Contemporary Amperex Technology Co., Limited
Most cited
By later US patents
- Particle detection on patterned wafers and the like173US 4,898,471 ATencor Instruments · 1990
- Spectroscopic scatterometer system173US 6,483,580 B1KLA-Tencor Technologies Corporation · 2002
- Method of inspecting articles121US 5,495,535 AOrbotech Ltd. · 1996
- Pattern inspection system109US 4,783,826 AGerber Scientific, Inc. · 1988
- Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected106US 5,774,222 AHitachi, Ltd. · 1998