G01N 2021/8416
And process controlling, not otherwise provided for
Official title: {and process controlling, not otherwise provided for}
G01N2021/8416 (And process controlling, not otherwise provided for) appears on 288 US grants and 397 published applications in this corpus.
Search patents in G01N- Granted patents
- 288
- Published applications
- 397
- Assignees
- 256
- Inventors
- 984
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 2 | 7 |
| 2005 | 3 | 6 |
| 2006 | 4 | 4 |
| 2007 | 3 | 3 |
| 2008 | 8 | 12 |
| 2009 | 8 | 14 |
| 2010 | 9 | 15 |
| 2011 | 5 | 8 |
| 2012 | 5 | 12 |
| 2013 | 10 | 7 |
| 2014 | 7 | 9 |
| 2015 | 8 | 11 |
| 2016 | 7 | 24 |
| 2017 | 10 | 18 |
| 2018 | 18 | 25 |
| 2019 | 27 | 27 |
| 2020 | 21 | 26 |
| 2021 | 22 | 35 |
| 2022 | 19 | 30 |
| 2023 | 27 | 27 |
| 2024 | 18 | 30 |
| 2025 | 30 | 24 |
| 2026 | 14 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and system for controlling the manufacture of rubber products in response to the physicochemical properties of a rubber mixture16 Jun 2026US 12,656,254 B2Compagnie Generale Des Etablissements Michelin
- Method for printing a decoration, and apparatus therefor9 Jun 2026US 12,650,341 B2SWISS KRONO Tec AG
- Method and system for determining a pattern deviation value of a visible surface of a panel9 Jun 2026US 12,651,330 B2Champion Link International Corporation
- In-line product monitoring in integrated continuous bio-manufacturing26 May 2026US 12,637,653 B2Genzyme Corporation
- Methods and systems for treating a heterogeneous mixture of materials26 May 2026US 12,640,238 B2Sixone Labs Ltd.
- Flow cell for optical spectroscopy, and method for monitoring biotechnological processes27 Aug 2026US 2026/0251554 A1Schott AG
- Analytical apparatus, analytical method and non-transitory computer readable medium20 Aug 2026US 2026/0243661 A1Yokogawa Electric Corporation
- Controlled Environment Photoresist Processing System and Method20 Aug 2026US 2026/0244113 A1
- Evaporation apparatus and method for evaporation6 Aug 2026US 2026/0227298 A1Biotage AB
- Full wafer metrology6 Aug 2026US 2026/0228877 A1Nova Ltd.
Most cited
By later US patents
- Method of making high performance optical edge and notch filters and resulting products62US 7,123,416 B1Semrock, Inc. · 2006
- Methods and systems for coherent imaging and feedback control for modification of materials44US 8,822,875 B2Queen's University at Kingston · 2014
- Automated product profiling apparatus and product slicing system using same43US 6,882,434 B1Formax, Inc. · 2005
- System for scatterometric measurements and applications39US 7,099,005 B1KLA-Tencor Technologies Corporation · 2006
- Automated product profiling apparatus and product slicing system using same39US 7,623,249 B2Formax, Inc. · 2009