C11D 3/367
Containing halogen
Official title: {containing halogen}
C11D3/367 (Containing halogen) appears on 16 US grants and 8 published applications in this corpus.
Search patents in C11D- Granted patents
- 16
- Published applications
- 8
- Assignees
- 11
- Inventors
- 34
- Latest grant
- 13 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 2 |
| 2012 | 3 | 1 |
| 2013 | 1 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Process solution for polymer processing13 Jan 2026US 12,525,445 B2Dongwoo Fine-Chem Co., Ltd.
- Water-repellent protective film, and chemical solution for forming protective film2 Oct 2018US 10,090,148 B2Central Glass Company, Limited
- Compositions comprising a fluorosurfactant and a hydrotrope14 Jan 2014US 8,628,682 B2E. I. Du Pont de Nemours and Company
- Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid30 Apr 2013US 8,431,516 B2
- Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid3 Apr 2012US 8,148,310 B2
- Process solution for polymer processing16 Jun 2022US 2022/0189760 A1Dongwoo Fine-Chem Co., Ltd.
- Water-Repellent Protective Film, and Chemical Solution for Forming Protective Film25 Jun 2015US 2015/0179433 A1Central Glass Company, Limited
- Compositions comprising a fluorosurfactant and a hydrotrope25 Apr 2013US 2013/0102685 A1E. I. Du Pont de Nemours and Company
- Composition and method for cleaning semiconductor substrates24 May 2012US 2012/0129345 A1
- Composition and method for cleaning semiconductor substrates13 Oct 2011US 2011/0247650 A1
Most cited
By later US patents
- Formulations for cleaning ion-implanted photoresist layers from microelectronic devices24US 8,114,220 B2Advanced Technology Materials, Inc. · 2012
- Light duty liquid cleaning composition19US 5,851,974 AColgate-Palmolive Company · 1998
- Chelation14US 4,440,646 APlains Chemical Development Co. · 1984
- Method and apparatus for washing dishes, sticking inhibitor and rinsing assistant9US 5,427,127 ADaikin Industries, Ltd. · 1995
- Process for the preparation of an alkali metal salt of a diester phosphoric acid8US 4,736,051 AKao Corporation · 1988