C08F 220/1806
C6-acrylate
Official title: {C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate}
C08F220/1806 (C6-acrylate) appears on 299 US grants and 494 published applications in this corpus.
Search patents in C08F- Granted patents
- 299
- Published applications
- 494
- Assignees
- 175
- Inventors
- 1,145
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 1 |
| 2003 | 0 | 1 |
| 2004 | 0 | 2 |
| 2005 | 1 | 1 |
| 2006 | 1 | 8 |
| 2007 | 0 | 8 |
| 2008 | 5 | 3 |
| 2009 | 3 | 10 |
| 2010 | 3 | 8 |
| 2011 | 4 | 15 |
| 2012 | 2 | 7 |
| 2013 | 16 | 13 |
| 2014 | 8 | 16 |
| 2015 | 8 | 14 |
| 2016 | 16 | 11 |
| 2017 | 6 | 25 |
| 2018 | 13 | 19 |
| 2019 | 12 | 39 |
| 2020 | 23 | 45 |
| 2021 | 25 | 47 |
| 2022 | 29 | 49 |
| 2023 | 42 | 55 |
| 2024 | 20 | 32 |
| 2025 | 30 | 37 |
| 2026 | 15 | 27 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for evaluating resist polymer25 Aug 2026US 12,716,841 B2Maruzen Petrochemical Co., Ltd.
- Resist material and patterning process11 Aug 2026US 12,704,780 B2Shin-Etsu Chemical Co., Ltd.
- Photosensitive resin film and application thereof23 Jun 2026US 12,663,715 B2Chang Chun Plastics Co., Ltd.
- Resist composition and patterning process16 Jun 2026US 12,656,683 B2Shin-Etsu Chemical Co., Ltd.
- Emulsion particle-containing aqueous dispersion19 May 2026US 12,630,654 B2Nippon Shokubai Co., Ltd.
- Resist composition, resist pattern formation method, compound and polymer compound1 Oct 2026US 2026/0299419 A1Tokyo Ohka Kogyo.Co., Ltd.
- Radiation-sensitive composition, resist pattern formation method, polymer, and compound17 Sep 2026US 2026/0277103 A1Jsr Corporation
- Radiation-sensitive composition, method for forming pattern, polymer, and compound3 Sep 2026US 2026/0259498 A1Jsr Corporation
- Polymers and methods for ophthalmic applications27 Aug 2026US 2026/0251820 A1Key Medical Technologies, Inc.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process20 Aug 2026US 2026/0242334 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Long wearable soft contact lens322US 6,867,245 B2Asahikasei Aime Co., Ltd · 2005
- Pressure sensitive adhesives with good low energy surface adhesion84US 5,602,221 AMinnesota Mining and Manufacturing Company · 1997
- Long-wearable soft contact lens84US 8,637,621 B2CooperVision International Holding Company, LP · 2014
- Latex polymer blends for improving the permanence of ink-jet inks82US 6,057,384 AHewlett-Packard Company · 2000
- Dual encapsulation technique for preparing ink-jets inks77US 5,990,202 AHewlett-Packard Company · 1999