C08F 116/10
Carbocyclic compounds
C08F116/10 (Carbocyclic compounds) appears on 2 US grants and 5 published applications in this corpus.
Search patents in C08F- Granted patents
- 2
- Published applications
- 5
- Assignees
- 3
- Inventors
- 9
- Latest grant
- 27 Feb 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2016 | 0 | 1 |
| 2017 | 1 | 1 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
By publication year.
Recent patents
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device27 Feb 2018US 9,904,168 B2FUJIFILM Corporation
- Monomer, polymer, positive resist composition, and patterning process28 Nov 2017US 9,829,792 B2Shin-Etsu Chemical Co., Ltd.
- Method of forming patterns10 Apr 2025US 2025/0115691 A1Samsung SDI.Co., Ltd.
- Method of forming patterns21 Dec 2023US 2023/0406970 A1Samsung SDI.Co., Ltd.
- Polymer, organic layer composition and method of forming patterns27 Feb 2020US 2020/0062875 A1Samsung SDI.Co., Ltd.
- Monomer, polymer, positive resist composition, and patterning process12 Jan 2017US 2017/0008982 A1Shin-Etsu Chemical Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device3 Nov 2016US 2016/0320700 A1FUJIFILM Corporation
Most cited
By later US patents