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US 9,904,168 B2Granted
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
AssigneeFUJIFILM Corporation
InventorsNatsumi Yokokawa, Shuhei Yamaguchi, Koutarou Takahashi
Life of this patent
Estimating the term…
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin (A) containing a repeating unit represented by General Formula (4) and a crosslinking agent (C) containing a polar group, in which the crosslinking agent (C) is a compound represented by General Formula (1) or a compound in which two to five structures represented by General Formula (1) are connected via a linking group or a single bond represented by L1 in General Formula (3).
Claims10
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- a resin (A) containing a repeating unit represented by General Formula (4);
- and
- a crosslinking agent (C) containing a polar group,
- wherein the crosslinking agent (C) is a compound represented by General Formula (1), or a compound in which two to five structures represented by General Formula (1) are connected via a linking group or a single bond represented by L1 in General Formula (3),
- wherein in General Formula (1), R1 to R6 each independently represent a hydrogen atom, an organic group having 1 to 50 carbon atoms, or a binding site to a linking group or a single bond represented by L1 in General Formula (3), provided that at least one of R2, R3, R4, R5, or R6 is a group represented by General Formula (2), and at least one of R1, R2, R3, R4, R5, R6, or L1 in General Formula (3) is a polar group selected from the following structures, or a group containing a polar group selected from the following structures as a partial structure,
- in General Formula (2), R7 represents an organic group having 1 to 30 carbon atoms,
- in General Formula (3), L1 represents a linking group or a single bond, * represents a binding site in any one of R1, R2, R3, R4, R5, and R6, and k is an integer of 2 to 5, and
- in General Formula (4), R11 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R12 represents a hydrogen atom or an alkyl group, L11 represents a single bond or a linking group, X represents —Ar(OX1)m or —CO2X2 in which Ar represents an aromatic ring, X1 represents a hydrogen atom, a group having a non-acid-decomposable hydrocarbon structure, or a group having an acid-decomposable group, X2 represents a group capable of leaving by the action of an acid or a group having a group capable of leaving by the action of an acid, and m represents an integer of 1 to 12, or R12 and X may be bonded to each other to form a ring.
5 more elements
Dependencies are inferred from the claim text.