C07D 317/16
Radicals substituted by halogen atoms or nitro radicals
C07D317/16 (Radicals substituted by halogen atoms or nitro radicals) appears on 174 US grants and 42 published applications in this corpus.
Search patents in C07D- Granted patents
- 174
- Published applications
- 42
- Assignees
- 83
- Inventors
- 306
- Latest grant
- 24 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 12 | 0 |
| 1977 | 10 | 0 |
| 1978 | 17 | 0 |
| 1979 | 9 | 0 |
| 1980 | 19 | 0 |
| 1981 | 17 | 0 |
| 1982 | 4 | 0 |
| 1983 | 4 | 0 |
| 1984 | 3 | 0 |
| 1985 | 5 | 0 |
| 1986 | 5 | 0 |
| 1987 | 8 | 0 |
| 1988 | 5 | 0 |
| 1989 | 9 | 0 |
| 1990 | 5 | 0 |
| 1991 | 4 | 0 |
| 1992 | 3 | 0 |
| 1993 | 6 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 3 | 1 |
| 2007 | 1 | 6 |
| 2008 | 0 | 2 |
| 2009 | 3 | 2 |
| 2010 | 2 | 2 |
| 2011 | 3 | 2 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 1 |
| 2015 | 1 | 0 |
| 2016 | 1 | 2 |
| 2017 | 1 | 1 |
| 2018 | 2 | 2 |
| 2019 | 0 | 0 |
| 2020 | 1 | 1 |
| 2021 | 0 | 3 |
| 2022 | 0 | 0 |
| 2023 | 1 | 1 |
| 2024 | 0 | 7 |
| 2025 | 0 | 2 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for producing organic compound24 Feb 2026US 12,559,468 B2Daikin Industries, Ltd.
- Method for producing fluororesin13 Jan 2026US 12,522,679 B2Tosoh Corporation
- Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid28 Feb 2023US 11,592,746 B2Jsr Corporation
- Salt and photoresist composition containing the same2 Jun 2020US 10,670,963 B2Sumitomo Chemical Company, Limited
- Piperidine derivative, liquid crystal composition and liquid crystal display device21 Aug 2018US 10,053,425 B2Jnc Corporation
- Method for producing organic compound4 Jun 2026US 2026/0152479 A1Daikin Industries, Ltd.
- Composition containing fluorine-containing monomer and fluoride ions, method for producing fluorine-containing monomer having reduced fluoride ion content, and method for purifying fluorine-containing monomer7 May 2026US 2026/0125355 A1Daikin Industries, Ltd.
- Method for producing fluorine-containing dioxolane, and composition useful for producing same18 Dec 2025US 2025/0382275 A1Daikin Industries, Ltd.
- Radiation-sensitive composition, method for forming pattern, and radiation-sensitive acid generator27 Nov 2025US 2025/0362596 A1Jsr Corporation
- Composition containing fluorine-containing monomer, method for stabilizing fluorine-containing monomer, method for manufacturing fluorine-containing polymer, and method for manufacturing fluorine-containing monomer28 Nov 2024US 2024/0391893 A1Daikin Industries, Ltd.
Most cited
By later US patents
- Trifluorobenzene derivative and liquid crystal composition containing the same83US 5,032,313 AChisso Corporation · 1991
- Novel N-(3-hydroxy-4-piperidinyl)benzamide derivatives78US 4,962,115 AJanssen Pharmaceutica NV · 1990
- Triazole derivatives73US 4,079,062 AJanssen Pharmaceutica NV · 1978
- Novel N-(3-hydroxy-4-piperidinyl) benzamide derivatives60US 5,057,525 AJanssen Pharmaceutica NV · 1991
- Secondary amines, their preparation and use in pharmaceutical compositions56US 4,396,627 ABeecham Group Limited · 1983