Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid

A resist pattern-forming method comprising:

• applying a radiation-sensitive resin composition directly or indirectly on a substrate to form a resist film;
• exposing the resist film;
• and
• developing the resist film exposed,
• wherein the radiation-sensitive resin composition comprises:
• a polymer that comprises a structural unit comprising an acid-labile group;
• and
• a radiation-sensitive acid generating agent,
• wherein the radiation-sensitive acid generating agent is a compound represented by formula (1):
• wherein, in the formula (1),
• A1 represents a group obtained from a compound which comprises a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring;
• R1 represents a monovalent group having 0 to 10 carbon atoms which comprises at least one of an oxygen atom and a nitrogen atom;
• R2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, a monovalent halogenated hydrocarbon group having 1 to 20 carbon atoms or a halogen atom;
• p is an integer of 1 to 10, q is an integer of 0 to 9 and r is an integer of 1 to 10, wherein (p+q+r) is no greater than 11;
• R3 represents a single bond, —O— or —COO—;
• A2 represents an organic group having a valency of (n+1) and having 3 to 30 carbon atoms that comprises a ring having 3 to 20 ring atoms;
• n is an integer of 1 to 3, wherein
• in a case in which there exist a plurality of R1s, the plurality of R1s are identical or different from each other,
• in a case in which there exist a plurality of R2s, the plurality of R2s are identical or different from each other, and
• in a case in which n is no less than 2, a plurality of A1s are identical or different from each other, a plurality of R3s are identical or different from each other, a plurality of p's are identical or different from each other, a plurality of p's are identical or different from each other, and a plurality of r's are identical or different from each other;
• R4 represents a fluorinated alkanediyl group having 1 to 10 carbon atoms;
• and
• X+ represents a monovalent radiation-sensitive onium cation.

A compound represented by formula (1):

• wherein, in the formula (1),
• A1 represents a group obtained from a compound which comprises a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring;
• R1 represents a monovalent group having 0 to 10 carbon atoms which comprises at least one of an oxygen atom and a nitrogen atom;
• R2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, a monovalent halogenated hydrocarbon group having 1 to 20 carbon atoms or a halogen atom;
• p is an integer of 1 to 10, q is an integer of 0 to 9 and r is an integer of 1 to 10, wherein (p+q+r) is no greater than 11;
• R3 represents a single bond, —O— or —COO—;
• A2 represents an organic group having a valency of (n+1) and having 3 to 30 carbon atoms that comprises a ring having 3 to 20 ring atoms;
• n is an integer of 1 to 3, wherein
• in a case in which there exist a plurality R1s, the plurality R1s are identical or different from each other,
• in a case in which there exist a plurality of R2s, the plurality of R2s are identical or different from each other, and
• in a case in which n is no less than 2, a plurality of A1s are identical or different from each other, a plurality of R3s are identical or different from each other, a plurality of p's are identical or different from each other, a plurality of q's are identical or different from each other, and a plurality of r's are identical or different from each other;
• R4 represents a fluorinated alkanediyl group having 1 to 10 carbon atoms;
• and
• X+ represents a monovalent radiation-sensitive onium cation.