C07D 231/16
Halogen atoms or nitro radicals
C07D231/16 (Halogen atoms or nitro radicals) appears on 601 US grants and 499 published applications in this corpus.
Search patents in C07D- Granted patents
- 601
- Published applications
- 499
- Assignees
- 233
- Inventors
- 1,603
- Latest grant
- 3 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 7 | 0 |
| 1977 | 7 | 0 |
| 1978 | 14 | 0 |
| 1979 | 5 | 0 |
| 1980 | 5 | 0 |
| 1981 | 6 | 0 |
| 1982 | 5 | 0 |
| 1983 | 4 | 0 |
| 1984 | 6 | 0 |
| 1985 | 7 | 0 |
| 1986 | 4 | 0 |
| 1987 | 8 | 0 |
| 1988 | 7 | 0 |
| 1989 | 5 | 0 |
| 1990 | 12 | 0 |
| 1991 | 12 | 0 |
| 1992 | 9 | 0 |
| 1993 | 16 | 0 |
| 1994 | 4 | 0 |
| 1995 | 11 | 0 |
| 1996 | 20 | 0 |
| 1997 | 9 | 0 |
| 1998 | 10 | 0 |
| 1999 | 19 | 0 |
| 2000 | 18 | 0 |
| 2001 | 10 | 1 |
| 2002 | 19 | 8 |
| 2003 | 14 | 16 |
| 2004 | 8 | 32 |
| 2005 | 6 | 24 |
| 2006 | 12 | 11 |
| 2007 | 10 | 30 |
| 2008 | 15 | 22 |
| 2009 | 10 | 24 |
| 2010 | 21 | 33 |
| 2011 | 19 | 28 |
| 2012 | 22 | 16 |
| 2013 | 19 | 28 |
| 2014 | 21 | 19 |
| 2015 | 28 | 26 |
| 2016 | 21 | 32 |
| 2017 | 26 | 27 |
| 2018 | 25 | 24 |
| 2019 | 17 | 13 |
| 2020 | 14 | 12 |
| 2021 | 6 | 16 |
| 2022 | 8 | 11 |
| 2023 | 5 | 21 |
| 2024 | 6 | 10 |
| 2025 | 8 | 8 |
| 2026 | 1 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Dendrene amide compound, bactericide and use thereof3 Feb 2026US 12,540,118 B2Jiangsu Flag Chemical Industry Co., Ltd.
- Pyrazole derivatives for the treatment of cystic fibrosis9 Dec 2025US 12,492,193 B2Fondazione Instituto Italiano Di Tecnologia
- Preparation of substituted pyrazoles and their use as anthranilamides precursors4 Nov 2025US 12,459,913 B2Adama Makhteshim Ltd.
- Benzothiophene derivative regulator, preparation method therefor and use thereof4 Nov 2025US 12,459,931 B2Jiangsu Hansoh Pharmaceutical Group Co., Ltd.
- ACSS2 inhibitors and methods of use thereof14 Oct 2025US 12,441,689 B2EpiVario, Inc.
- Inhibitors of myc and uses thereof17 Sep 2026US 2026/0274827 A1Northwestern University
- Resist composition, resist pattern formation method, compound, and acid generator6 Aug 2026US 2026/0227692 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method for forming resist pattern, compound, and acid diffusion control agent30 Jul 2026US 2026/0219568 A1Tokyo Ohka Kogyo.Co., Ltd.
- Tethered heterocyclic inhibitors of kras g12c mutant proteins and uses thereof2 Jul 2026US 2026/0184711 A1Amgen Inc.
- Resist composition, laminate, and patterning process18 Jun 2026US 2026/0169380 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Composition for the oxidative dyeing of hair containing 4,5-diaminopyrazole derivatives as well as new 4,5-diaminopyrazole derivatives and process for their synthesis334US 5,534,267 AWella Aktiengesellschaft · 1996
- Nitrogen containing heteroaromatics as factor Xa inhibitors211US 6,020,357 ADuPont Pharmaceuticals Company · 2000
- Derivatives of N-phenylpyrazoles191US 5,232,940 A1993
- Substituted pyrazolyl benzenesulfonamides165US 5,466,823 AG. D. Searle & Co. · 1995
- Substituted pyrazolyl benzenesulfonamides for the treatment of inflammation149US 5,760,068 AG. D. Searle & Co. · 1998