C07C 63/70
Monocarboxylic acids
C07C63/70 (Monocarboxylic acids) appears on 92 US grants and 62 published applications in this corpus.
Search patents in C07C- Granted patents
- 92
- Published applications
- 62
- Assignees
- 50
- Inventors
- 179
- Latest grant
- 31 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 3 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 5 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 2 |
| 2004 | 2 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 1 |
| 2008 | 0 | 2 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 9 |
| 2015 | 8 | 1 |
| 2016 | 3 | 11 |
| 2017 | 7 | 12 |
| 2018 | 1 | 1 |
| 2019 | 4 | 4 |
| 2020 | 3 | 3 |
| 2021 | 3 | 4 |
| 2022 | 0 | 1 |
| 2023 | 3 | 2 |
| 2024 | 1 | 2 |
| 2025 | 0 | 2 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Resist topcoat composition, and method of forming patterns using the composition31 Mar 2026US 12,590,221 B2Samsung Electronics Co., Ltd.
- Resist composition and patterning process4 Jun 2024US 12,001,139 B2Shin-Etsu Chemical Co., Ltd.
- Method for producing an organic electronic component, and organic electronic component22 Aug 2023US 11,731,988 B2Novaled GmbH
- Resist composition and pattern forming process8 Aug 2023US 11,720,019 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition and method for producing resist pattern20 Jun 2023US 11,681,220 B2Sumitomo Chemical Company, Limited
- Resist composition, resist pattern formation method, compound, and acid diffusion control agent18 Jun 2026US 2026/0169378 A1Tokyo Ohka Kogyo.Co., Ltd.
- Onium salt, chemically amplified resist composition, and pattern forming process12 Mar 2026US 2026/0070876 A1Shin-Etsu Chemical Co., Ltd.
- Processes for preparation of prmt5 inhibitors and intermediates for making the same2 Oct 2025US 2025/0304556 A1Mirati Therapeutics, Inc.
- Method for producing active ray-sensitive or radiation-sensitive resin composition, method for producing onium salt compound for active ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and onium salt composition22 May 2025US 2025/0164884 A1FUJIFILM Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compounds10 Oct 2024US 2024/0337931 A1FUJIFILM Corporation
Most cited
By later US patents
- Anti-inflammatory oxazole[4,5-b]pyridines57US 4,038,396 AMerck & Co., Inc. · 1977
- Process of forming polysubstituted fullerenes35US 5,177,248 AExxon Research & Engineering Co. · 1993
- Polysubstituted fullerenes and their preparation35US 5,294,732 AExxon Research & Engineering Co. · 1994
- Polysubstituted fullerenes and their preparation (C-2608)33US 5,416,188 AExxon Research & Engineering Co. · 1995
- 2,4-Dichloro-5-fluorobenzoyl halide and a process for its preparation28US 4,439,620 ABayer Aktiengesellschaft · 1984