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US 11,681,220 B2Granted
Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsYukako Anryu, Satoshi Yamaguchi, Koji Ichikawa
Life of this patent
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Abstract
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator: wherein, in formula (I), R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.
Claims18
A resist composition comprising
- a compound represented by formula (I),
- a resin having an acid-labile group,
- an acid generator, and
- a salt generating an acid having an acidity lower than that of an acid generated from the acid generator:
- wherein, in formula (I),
- R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms,
- m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.
4 more elements
Dependencies are inferred from the claim text.