Resist composition, resist pattern formation method, compound, and acid diffusion control agent

A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:

• a base material component (A) whose solubility in a developing solution is changed by the action of the acid;
• and
• a compound (D0) represented by General Formula (d0),
• wherein Z represents a polycyclic ring group including a benzene ring, Rd01 represents a substituent, j represents an integer of 0 or greater as long as the valence is allowed, in a case where j represents an integer of 2 or greater, a plurality of Rd01's may be the same as or different from each other, Xd01 represents an iodine atom or a bromine atom, k represents an integer of 1 or greater as long as the valence is allowed, in a case where k represents an integer of 2 or greater, a plurality of Xd01's may be the same as or different from each other, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cation.