C07C 59/115
Containing halogen
Official title: containing halogen
C07C59/115 (Containing halogen) appears on 30 US grants and 29 published applications in this corpus.
Search patents in C07C- Granted patents
- 30
- Published applications
- 29
- Assignees
- 22
- Inventors
- 82
- Latest grant
- 4 Mar 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 1 |
| 2004 | 0 | 0 |
| 2005 | 1 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 0 | 1 |
| 2014 | 2 | 4 |
| 2015 | 1 | 1 |
| 2016 | 2 | 1 |
| 2017 | 0 | 1 |
| 2018 | 2 | 0 |
| 2019 | 0 | 4 |
| 2020 | 3 | 4 |
| 2021 | 1 | 5 |
| 2022 | 3 | 2 |
| 2023 | 3 | 0 |
| 2024 | 1 | 2 |
| 2025 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Onium salt, chemically amplified resist composition and patterning process4 Mar 2025US 12,240,804 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition and patterning process4 Jun 2024US 12,001,139 B2Shin-Etsu Chemical Co., Ltd.
- Fluorinated beta-hydroxybutyric acids for PET imaging5 Dec 2023US 11,833,228 B2The Governors of the University of Alberta
- Resist composition and pattern forming process8 Aug 2023US 11,720,019 B2Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive resin composition and resist pattern-forming method21 Mar 2023US 11,609,495 B2Jsr Corporation
- Derivatives of sobetirome26 Dec 2024US 2024/0425437 A1Oregon Health & Science University
- Sulfonium salt, resist composition and pattern forming process12 Sep 2024US 2024/0302740 A1Shin-Etsu Chemical Co., Ltd.
- Onium salt, chemically amplified resist composition and patterning process28 Apr 2022US 2022/0127225 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition and patterning process10 Feb 2022US 2022/0043343 A1Shin-Etsu Chemical Co., Ltd.
- 4-hydroxybutyric acid analogs30 Dec 2021US 2021/0403407 A1Concert Pharmaceuticals, Inc.
Most cited
By later US patents
- Amide derivatives129US 4,191,775 AImperial Chemical Industries PLC · 1980
- 4-hydroxybutyric acid analogs72US 8,759,394 B2Concert Pharmaceuticals, Inc. · 2014
- 4-hydroxybutyric acid analogs30US 9,309,182 B2Concert Pharmaceuticals, Inc. · 2016
- Derivatives of sobetirome7US 10,544,075 B2Oregon Health & Science University · 2020
- Derivatives of sobetirome7US 10,870,616 B2Oregon Health & Science University · 2020