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US 2022/0127225 A1Published application
Onium salt, chemically amplified resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakayuki Fujiwara, Satoshi Watanabe, Kousuke Ohyama
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Abstract
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.
Claims16
An onium salt having the formula (1):
- wherein X is sulfur or iodine,
- n is 1 when X is sulfur and n is 0 when X is iodine,
- R1 is a C1-C5 hydrocarbyl group which may contain fluorine or oxygen,
- R2 and R3 are each independently a C1-C30 hydrocarbyl group which may contain a heteroatom, R2 and R3 may bond together to form a ring with X to which they are attached,
- Ar is a C6-C14 arylene group which may be substituted with a substituent selected from a halogen atom, hydroxy group, C1-C10 hydrocarbyl group which may contain a heteroatom, C1-C10 hydrocarbyloxy group which may contain a heteroatom, C2-C10 hydrocarbylcarbonyl group which may contain a heteroatom, and C2-C10 hydrocarbylcarbonyloxy group which may contain a heteroatom, R2 and Ar may bond together to form a ring with X to which they are attached, and
- Z− is a carboxylate, sulfonamide, sulfonimide or methide anion.
3 more elements
Dependencies are inferred from the claim text.