C07C 309/39
Containing halogen atoms bound to the carbon skeleton
Official title: containing halogen atoms bound to the carbon skeleton
C07C309/39 (Containing halogen atoms bound to the carbon skeleton) appears on 31 US grants and 28 published applications in this corpus.
Search patents in C07C- Granted patents
- 31
- Published applications
- 28
- Assignees
- 26
- Inventors
- 108
- Latest grant
- 4 Feb 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 2 |
| 2008 | 1 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 2 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 1 | 1 |
| 2015 | 1 | 1 |
| 2016 | 2 | 3 |
| 2017 | 1 | 3 |
| 2018 | 1 | 3 |
| 2019 | 2 | 3 |
| 2020 | 4 | 3 |
| 2021 | 1 | 0 |
| 2022 | 1 | 1 |
| 2023 | 2 | 0 |
| 2024 | 0 | 3 |
| 2025 | 1 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- Photoacid generator4 Feb 2025US 12,216,402 B2International Business Machines Corporation
- Photoacid generator19 Dec 2023US 11,846,886 B2International Business Machines Corporation
- Photoresist pattern trimming compositions and pattern formation methods12 Sep 2023US 11,754,927 B2Rohm and Haas Electronic Materials LLC
- Corrosion inhibiting coating additive21 Jun 2022US 11,365,321 B2Battelle Memorial Institute
- Resist composition and resist patterning process28 Sep 2021US 11,131,926 B2Shin-Etsu Chemical Co., Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process31 Jul 2025US 2025/0244665 A1Shin-Etsu Chemical Co., Ltd.
- High-purity 4-(2-bromoethyl)benzenesulfonic acid, high-purity styrenesulfonic acid compound derived therefrom, and polymer thereof, and methods for producing same20 Mar 2025US 2025/0092171 A1Tosoh Finechem Corporation
- Preparation method of pilocarpine and its intermediate compounds11 Jul 2024US 2024/0228425 A1Zhejiang Ausun Pharmaceutical Co., Ltd.
- Radiation-sensitive resin composition and pattern formation method9 May 2024US 2024/0152048 A1Jsr Corporation
- Photoacid generator29 Feb 2024US 2024/0069442 A1International Business Machines Corporation
Most cited
By later US patents
- Bis-stilbene compounds28US 3,984,399 ACiba-Geigy Corporation · 1976
- Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition18US 8,900,791 B2FUJIFILM Corporation · 2014
- Distyrylbiphenyl compounds7US 5,145,991 ACiba-Geigy Corporation · 1992
- Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition7US 7,341,817 B2FUJIFILM Corporation · 2008
- Resist composition and patterning process6US 10,613,437 B2Shin-Etsu Chemical Co., Ltd. · 2020