B08B 7/0035
Cleaning by methods not provided for in a single other subclass or
Official title: {by radiant energy, e.g. UV, laser, light beam or the like}
B08B7/0035 (Cleaning by methods not provided for in a single other subclass or) appears on 1,269 US grants and 1,673 published applications in this corpus.
Search patents in B08B- Granted patents
- 1,269
- Published applications
- 1,673
- Assignees
- 732
- Inventors
- 3,873
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 3 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 6 | 0 |
| 1989 | 5 | 0 |
| 1990 | 5 | 0 |
| 1991 | 7 | 0 |
| 1992 | 8 | 0 |
| 1993 | 9 | 0 |
| 1994 | 12 | 0 |
| 1995 | 9 | 0 |
| 1996 | 17 | 0 |
| 1997 | 24 | 0 |
| 1998 | 37 | 0 |
| 1999 | 32 | 0 |
| 2000 | 24 | 0 |
| 2001 | 24 | 21 |
| 2002 | 30 | 48 |
| 2003 | 49 | 40 |
| 2004 | 35 | 85 |
| 2005 | 28 | 81 |
| 2006 | 28 | 97 |
| 2007 | 19 | 50 |
| 2008 | 23 | 56 |
| 2009 | 20 | 51 |
| 2010 | 20 | 46 |
| 2011 | 30 | 45 |
| 2012 | 38 | 32 |
| 2013 | 32 | 32 |
| 2014 | 19 | 51 |
| 2015 | 30 | 47 |
| 2016 | 32 | 63 |
| 2017 | 49 | 84 |
| 2018 | 36 | 87 |
| 2019 | 63 | 96 |
| 2020 | 81 | 91 |
| 2021 | 78 | 108 |
| 2022 | 62 | 99 |
| 2023 | 68 | 94 |
| 2024 | 64 | 70 |
| 2025 | 59 | 59 |
| 2026 | 41 | 40 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Cleaning method, recording medium, and substrate processing apparatus15 Sep 2026US 12,734,561 B2Kokusai Electric Corporation
- Cleaning apparatus, cleaning method, and battery production system15 Sep 2026US 12,734,563 B2Contemporary Amperex Technology Co., Limited
- Lower deposition chamber CCP electrode cleaning solution8 Sep 2026US 12,731,771 B2APPLIED Materials.Inc.
- Ultrasonic cleaning machine1 Sep 2026US 12,722,186 B1
- Test base cleaning line and method thereof8 Oct 2026US 2026/0307115 A1Siliconware Precision Industries Co., Ltd.
- Apparatus and method for removal of oxide and carbon from semiconductor films in a single processing chamber8 Oct 2026US 2026/0314290 A1ASM IP Holding B. V.
- Transportable Cleaning Device for Cleaning Marking Elements and Cleaning Method1 Oct 2026US 2026/0297874 A1Glatt GmbH
- Laser ablation decontamination system and method of using same1 Oct 2026US 2026/0301983 A1
- Laser cleaning battery components24 Sep 2026US 2026/0284716 A1Milwaukee Electric Tool Corporation
Most cited
By later US patents
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas571US 6,863,019 B2APPLIED Materials.Inc. · 2005
- Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials558US 7,357,138 B2Air Products and Chemicals, Inc. · 2008
- Methods and apparatus for gettering fluorine from chamber material surfaces555US 6,347,636 B1APPLIED Materials.Inc. · 2002
- Plasma clean method for deposition chamber542US 8,591,659 B1Novellus Systems, Inc. · 2013