SPC Electronics Corporation
Tokyo, JP· latest recorded location
SPC Electronics Corporation is named on 6 US grants and 4 published applications in this corpus. Its most frequent classification is H10P (Generic processes or apparatus for the manufacture or treatment of devices covered).
- Granted patents
- 6
- Published applications
- 4
- Inventors
- 26
- Granted in 2026 so far
- 0
- Most recent grant
- 5 Jun 2012
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 2 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 1 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
By publication year.
Technology areas
Share of 10 documents
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered4
- Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4
- B08BCleaning in general3
- H01PWaveguides2
- H01QAntennas, i.e. radio aerials2
- G03FPhotomechanical production of textured or patterned surfaces1
- H05BElectric heating1
Recent patents
- Waveguide circulator5 Jun 2012US 8,193,872 B2
- Primary radiator for parabolic antenna11 Apr 2006US 7,027,003 B2
- Substrate treatment method9 Sep 2003US 6,616,773 B1
- Wafer cleaning device and tray for use in wafer cleaning device9 Sep 2003US 6,616,774 B2
- Multi-step flow cleaning method and multi-step flow cleaning apparatus13 Aug 2002US 6,432,218 B1
- Waveguide circulator19 Aug 2010US 2010/0207701 A1
- Substrate cleaning system and substrate cleaning method11 Jan 2007US 2007/0006904 A1
- Primary radiator for parabolic antenna18 Nov 2004US 2004/0227686 A1
- Wafer cleaning device and tray for use in wafer cleaning device6 Jun 2002US 2002/0066472 A1
Most cited
By later US patents