Wafer cleaning device and tray for use in wafer cleaning device

A method for wafer cleaning comprising:

• arranging a plurality of wafers, each having two opposing sides and a top and a bottom face, and seating the wafers in grasping grooves on a band-shaped tray such that each of the two opposing sides of each wafer are grasped by respective grasping grooves;
• placing the band-shaped tray and arranged wafers into a cleaning tank having a bottom face generally conforming to a bottom-faced shape of a wafer;
• placing the band-shaped tray onto a guide fixing the tray at a predetermined position in the cleaning tank;
• flowing cleaning fluid at a flow rate from the bottom face of the cleaning tank over the bottom and top faces of each wafer;
• elevating the wafers slightly upward from the bottom face of the cleaning tank thereby exposing a portion of opposing sides of each wafer that were grasped in the grasping grooves to the cleaning fluid;
• returning each wafer back to a seated position in the grasping grooves;
• and
• removing the plurality of wafers from the cleaning tank.