Y10S 359/904
Micromirror
Y10S359/904 (Micromirror) appears on 259 US grants and 181 published applications in this corpus.
Search patents in Y10S- Granted patents
- 259
- Published applications
- 181
- Assignees
- 95
- Inventors
- 340
- Latest grant
- 1 Aug 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 15 | 0 |
| 1998 | 17 | 0 |
| 1999 | 9 | 0 |
| 2000 | 3 | 0 |
| 2001 | 9 | 1 |
| 2002 | 15 | 25 |
| 2003 | 23 | 26 |
| 2004 | 19 | 29 |
| 2005 | 29 | 38 |
| 2006 | 47 | 28 |
| 2007 | 35 | 9 |
| 2008 | 7 | 7 |
| 2009 | 2 | 2 |
| 2010 | 5 | 2 |
| 2011 | 1 | 2 |
| 2012 | 5 | 3 |
| 2013 | 0 | 0 |
| 2014 | 7 | 3 |
| 2015 | 4 | 2 |
| 2016 | 1 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 1 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 1 |
| 2022 | 1 | 1 |
| 2023 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Surface micromachined structures1 Aug 2023US 11,713,243 B2Texas Instruments Incorporated
- Surface micromachined structures6 Sep 2022US 11,434,130 B2Texas Instruments Incorporated
- Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus20 Feb 2018US 9,897,925 B2Carl Zeiss SMT GmbH
- Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus19 Jan 2016US 9,239,229 B2Carl Zeiss SMT GmbH
- Optical scanner and image forming apparatus15 Sep 2015US 9,134,533 B2Seiko Epson Corporation
- Surface micromachined structures29 Dec 2022US 2022/0411262 A1Texas Instruments Incorporated
- Surface micromachined structures1 Jul 2021US 2021/0198103 A1Texas Instruments Incorporated
- Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus30 Aug 2018US 2018/0246415 A1Carl Zeiss SMT GmbH
- Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus15 Sep 2016US 2016/0266502 A1Carl Zeiss SMT GmbH
- Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus22 Oct 2015US 2015/0300807 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Bistable microelectromechanical actuator511US 5,867,302 ASandia Corporation · 1999
- Optimized electronic operation of digital micromirror devices377US 5,444,566 ATexas Instruments Incorporated · 1995
- Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements377US 6,046,840 AReflectivity, INC · 2000
- Support post architecture for micromechanical devices340US 6,447,126 B1Texas Instruments Incorporated · 2002
- Optical switching apparatus324US 6,295,154 B1Texas Instruments Incorporated · 2001