Surface micromachined structures
AssigneeTexas Instruments Incorporated
InventorsPatrick Ian Oden, James Norman Hall
Life of this patent
Estimating the term…
Abstract
In one example, a method comprises forming a first layer on a substrate surface, forming an opening in the first layer, forming a second layer on the first layer and in the opening, and forming a photoresist layer on the second layer, in which the photoresist layer has a first curved surface over a first part of the first layer and over the opening. The method further comprises etching the photoresist layer and a second part of the second layer over the first part of the first layer to form a second curved surface on the second part of the second layer, and forming a mirror element and a support structure in the second layer, including by etching a third part of the second layer and removing the first layer.
Claims20
A method comprising:
- forming a first layer on a substrate surface;
- forming an opening in the first layer;
- forming a second layer on the first layer and in the opening;
- forming a photoresist layer on the second layer, in which the photoresist layer has a first curved surface over a first part of the first layer and over the opening;
- etching the photoresist layer and a second part of the second layer over the first part of the first layer to form a second curved surface on the second part of the second layer;
- and
- forming a mirror element and a support structure in the second layer, including by etching a third part of the second layer and removing the first layer, in which the mirror element has the second curved surface, and the support structure is coupled between the mirror element and the substrate surface.
Dependencies are inferred from the claim text.