H05H 1/0062
By using microwaves
Official title: {by using microwaves}
H05H1/0062 (By using microwaves) appears on 18 US grants and 15 published applications in this corpus.
Search patents in H05H- Granted patents
- 18
- Published applications
- 15
- Assignees
- 16
- Inventors
- 56
- Latest grant
- 11 Feb 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 1 | 1 |
| 2003 | 1 | 2 |
| 2004 | 3 | 0 |
| 2005 | 1 | 1 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 2 |
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 1 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 1 | 2 |
| 2022 | 0 | 0 |
| 2023 | 1 | 1 |
| 2024 | 1 | 0 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer11 Feb 2025US 12,222,362 B2Samsung Electronics Co., Ltd.
- Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried9 Jan 2024US 11,867,643 B2Korea Research Institute of Standards and Science
- Probe for measuring plasma parameters24 Oct 2023US 11,800,627 B2Ruhr-UniversitäT Bochum
- Ignition apparatus including spark plug that generates plasma21 Sep 2021US 11,129,268 B2Denso Corporation
- Method for plasma dynamic cancellation for hypersonic vehicles15 May 2018US 9,972,907 B2Raytheon Company
- Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer8 May 2025US 2025/0146917 A1Samsung Electronics Co., Ltd.
- Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer2 Mar 2023US 2023/0060400 A1Samsung Electronics Co., Ltd.
- Probe for Measuring Plasma Parameters12 Aug 2021US 2021/0251067 A1Ruhr-UniversitäT Bochum
- Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried22 Apr 2021US 2021/0116393 A1Korea Research Institute of Standards and Science
- Ignition apparatus27 Sep 2018US 2018/0279460 A1Denso Corporation
Most cited
By later US patents
- Harmonic derived arc detector92US 7,728,602 B2MKS Instruments, Inc. · 2010
- Harmonic derived arc detector57US 8,890,537 B2MKS Instruments, Inc. · 2014
- Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus50US 6,339,297 B12002
- Method for determining absolute plasma parameters23US 5,705,931 AAdolph Slaby Instituut Forschungsgesellschaft fur Plasmatechnologie und Mikrostrukturierung mbH · 1998
- Method and apparatus for determining of absolute plasma parameters18US 5,861,752 A1999