H01S 3/2258
F2, i.e. molecular fluoride is comprised for lasing around 157 nm
Official title: {F2, i.e. molecular fluoride is comprised for lasing around 157 nm}
H01S3/2258 (F2, i.e. molecular fluoride is comprised for lasing around 157 nm) appears on 112 US grants and 113 published applications in this corpus.
Search patents in H01S- Granted patents
- 112
- Published applications
- 113
- Assignees
- 21
- Inventors
- 171
- Latest grant
- 26 Aug 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 1 | 3 |
| 2002 | 8 | 32 |
| 2003 | 21 | 19 |
| 2004 | 19 | 14 |
| 2005 | 14 | 13 |
| 2006 | 10 | 4 |
| 2007 | 9 | 2 |
| 2008 | 3 | 1 |
| 2009 | 2 | 1 |
| 2010 | 4 | 1 |
| 2011 | 1 | 2 |
| 2012 | 2 | 2 |
| 2013 | 0 | 1 |
| 2014 | 2 | 1 |
| 2015 | 2 | 3 |
| 2016 | 2 | 3 |
| 2017 | 3 | 2 |
| 2018 | 3 | 1 |
| 2019 | 0 | 2 |
| 2020 | 1 | 1 |
| 2021 | 1 | 1 |
| 2022 | 0 | 3 |
| 2023 | 1 | 0 |
| 2024 | 0 | 1 |
| 2025 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Gas control method and related uses26 Aug 2025US 12,401,167 B2Cymer, Inc.
- Capped blocking coating for laser optics20 May 2025US 12,308,598 B2Corning Incorporated
- Electrode for a discharge chamber5 Sep 2023US 11,749,520 B2Cymer, Inc.
- Electrode for a discharge chamber21 Sep 2021US 11,127,582 B2Cymer, Inc.
- Laser gas regeneration system and laser system29 Dec 2020US 10,879,664 B2Gigaphoton Inc.
- Bearing apparatus and laser apparatus comprising bearing apparatus1 Feb 2024US 2024/0035514 A1Ebara Corporation
- Controlling a spectral property of an output light beam produced by an optical source1 Dec 2022US 2022/0385031 A1Cymer, Inc.
- Capped blocking coating for laser optics29 Sep 2022US 2022/0311200 A1Corning Incorporated
- Gas control method and related uses8 Sep 2022US 2022/0285902 A1Cymer, Inc.
- Electrode for a discharge chamber9 Dec 2021US 2021/0384027 A1Cymer, Inc.
Most cited
By later US patents
- Very narrow band, two chamber, high rep rate gas discharge laser system144US 6,567,450 B2Cymer, Inc. · 2003
- Very narrow band, two chamber, high rep rate gas discharge laser system136US 6,625,191 B2Cymer, Inc. · 2003
- Gas discharge laser with pulse multiplier98US 6,535,531 B1Cymer, Inc. · 2003
- Injection seeded laser with precise timing control96US 6,549,551 B2Cymer, Inc. · 2003
- Laser spectral engineering for lithographic process80US 6,671,294 B2Cymer, Inc. · 2003