H01J 3/20
Magnetic lenses
H01J3/20 (Magnetic lenses) appears on 44 US grants and 30 published applications in this corpus.
Search patents in H01J- Granted patents
- 44
- Published applications
- 30
- Assignees
- 29
- Inventors
- 70
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 5 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 1 | 2 |
| 2007 | 0 | 0 |
| 2008 | 1 | 2 |
| 2009 | 2 | 0 |
| 2010 | 1 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 2 | 6 |
| 2014 | 4 | 5 |
| 2015 | 4 | 2 |
| 2016 | 4 | 1 |
| 2017 | 3 | 3 |
| 2018 | 2 | 0 |
| 2019 | 1 | 1 |
| 2020 | 0 | 2 |
| 2021 | 3 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Charged particle source27 Jul 2021US 11,075,053 B2ASML Netherlands B. V.
- Magnetically microfocused electron emission source15 Jun 2021US 11,037,753 B2KLA Corporation
- Variable-focus magnetostatic lens4 May 2021US 10,998,158 B1Triad National Security, LLC
- Charged particle source5 Nov 2019US 10,468,227 B2Hermes Microvision, Inc.
- Photoelectron source, multi-photoelectron source and multi-beam irradiation apparatus7 Aug 2025US 2025/0253141 A1NuFlare Technology, Inc.
- Charged particle source3 Mar 2022US 2022/0068589 A1ASML Netherlands B. V.
- Charged particle source23 Apr 2020US 2020/0126753 A1ASML Netherlands B. V.
- Magnetically Microfocused Electron Emission Source9 Jan 2020US 2020/0013579 A1KLA-Tencor Corporation
- Charged Particle Source21 Feb 2019US 2019/0057833 A1Hermes Microvision, Inc.
Most cited
By later US patents
- Particle beam therapy system and adjustment method for particle beam therapy system47US 8,389,949 B2Mitsusbishi Electric Corporation · 2013
- Multiple electron lens18US 4,209,702 AKabushiki Kaisha Akashi Seisakusho · 1980
- Electron source11US 5,760,548 AInternational Business Machines Corporation · 1998
- Method of addressing a magnetic matrix electron source flat panel display11US 6,040,808 AInternational Business Machines Corporation · 2000
- Permanent magnet based high performance multi-axis immersion electron lens array with low axial leakage field10US 9,165,745 B2Maglen Pte Ltd · 2015