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US 10,468,227 B2Granted
Charged particle source
AssigneeHermes Microvision, Inc.
InventorShuai Li
Life of this patent
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Abstract
This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
Claims13
A method for providing an electron beam from an electron beam inspection tool, comprising:
- emitting an electron beam along an optical axis from a tip of an emitter;
- generating a first magnetic field with a first magnetic lens located above the tip of the emitter;
- and
- generating a second magnetic field with a second magnetic lens located below the tip of the emitter, wherein, upon the generation of the first magnetic field and the second magnetic field, the first magnetic field and the second magnetic field are superposed to provide a superposed magnetic field distribution to influence the electron beam based on an operation mode of the electron beam inspection tool.
1 more element
Dependencies are inferred from the claim text.