H01F 41/183
Sputtering targets therefor
Official title: {Sputtering targets therefor}
H01F41/183 (Sputtering targets therefor) appears on 86 US grants and 88 published applications in this corpus.
Search patents in H01F- Granted patents
- 86
- Published applications
- 88
- Assignees
- 56
- Inventors
- 204
- Latest grant
- 14 Jan 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 1 |
| 2002 | 6 | 3 |
| 2003 | 3 | 3 |
| 2004 | 4 | 6 |
| 2005 | 1 | 2 |
| 2006 | 1 | 2 |
| 2007 | 1 | 2 |
| 2008 | 1 | 3 |
| 2009 | 5 | 2 |
| 2010 | 3 | 3 |
| 2011 | 1 | 2 |
| 2012 | 1 | 5 |
| 2013 | 1 | 14 |
| 2014 | 1 | 5 |
| 2015 | 6 | 4 |
| 2016 | 4 | 5 |
| 2017 | 3 | 2 |
| 2018 | 1 | 3 |
| 2019 | 1 | 2 |
| 2020 | 6 | 6 |
| 2021 | 1 | 4 |
| 2022 | 3 | 2 |
| 2023 | 1 | 4 |
| 2024 | 1 | 1 |
| 2025 | 1 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- Nonmagnetic material-dispersed Fe-Pt based sputtering target14 Jan 2025US 12,198,911 B2JX Advanced Metals Corporation
- Sputtering target and magnetic film6 Feb 2024US 11,894,221 B2JX Metals Corporation
- In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering target7 Nov 2023US 11,810,700 B2Tanaka Kikinzoku Kogyo K.K.
- Sputtering target and method of producing sputtering target23 Aug 2022US 11,421,315 B2Ulvac, Inc.
- Sputtering target material5 Jul 2022US 11,377,726 B2Sanyo Special Steel Co., Ltd.
- Co-sputtering rare earth rotating target material, and preparation method, and application method therefor12 Jun 2025US 2025/0191818 A1Grirem Advanced Materials Co., Ltd.
- Boron-Based and High-Entropy Magnetic Materials5 Jun 2025US 2025/0182963 A1Georgetown University
- Soft magnetic multilayer desposition apparatus, methods of manufacturing and magnetic multilayer6 Jun 2024US 2024/0186064 A1
- Method of depositing a material13 Jul 2023US 2023/0220539 A1Dyson Technology Limited
- In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistance effect element, and sputtering target15 Jun 2023US 2023/0187109 A1Tanaka Kikinzoku Kogyo K.K.
Most cited
By later US patents
- Magnetic film forming method45US 6,210,544 B1Alps Electric Co., Ltd. · 2001
- Magnetron sputtering method and sputtering target32US 6,033,536 AKabushiki Kaisha Toshiba · 2000
- Soft magnetic thin film comprising alternate layers of iron carbide with either iron, iron nitride or iron carbon-nitride29US 5,068,147 AMatsushita Electric Industrial Co., Ltd. · 1991
- Composite target material and process for producing the same27US 4,620,872 AMitsubishi Kinzoku Kabushiki Kaisha · 1986
- Co-Cr-Pt-B alloy sputtering target23US 7,927,434 B2JX Nippon Mining & Metals Corporation · 2011