G05B 2219/32135
Apc advanced process control applications
Official title: APC advanced process control applications
G05B2219/32135 (Apc advanced process control applications) appears on 12 US grants and 14 published applications in this corpus.
Search patents in G05B- Granted patents
- 12
- Published applications
- 14
- Assignees
- 14
- Inventors
- 40
- Latest grant
- 16 Jan 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2006 | 0 | 1 |
| 2007 | 0 | 1 |
| 2008 | 3 | 1 |
| 2009 | 1 | 1 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 3 |
| 2013 | 2 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 2 | 1 |
| 2017 | 1 | 1 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 1 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 1 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Dispatch system and dispatch method for manufacturing mold16 Jan 2024US 11,872,725 B2Zhong Chuan Technology Limited
- Use of an advanced multivariable controller to control alphabutol units13 Aug 2019US 10,377,681 B2Axens
- Cloud computing system and method for advanced process control15 Aug 2017US 9,733,627 B2Honeywell International Inc.
- Semiconductor fabrication component retuning26 Apr 2016US 9,323,244 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Economics-based coordination of advanced process control and real-time optimization23 Feb 2016US 9,268,317 B2Shell Oil Company
- Method for Supporting a Process Change, Computer Program Product and System19 Mar 2026US 2026/0079476 A1Windmoller & Holscher
- Method and system for predicting control factors for manufacturing facilities based on machine learning5 Feb 2026US 2026/0036971 A1Samsung SDI.Co., Ltd.
- Dispatch system and dispatch method for manufacturing mold4 Mar 2021US 2021/0060823 A1Chung Chwan Enterprise Co., Ltd.
- Use of an advanced multivariable controller to control alphabutol units8 Jun 2017US 2017/0158581 A1Axens
- Cloud computing system and method for advanced process control18 Feb 2016US 2016/0048112 A1Honeywell International Inc.
Most cited
By later US patents
- Advanced process control system and method utilizing virtual metrology with reliance index11US 8,688,256 B2Foresight Technology Company, Ltd. · 2014
- Method and system of providing a dynamic sampling plan for integrated metrology4US 7,398,172 B2International Business Machines Corporation · 2008
- Applying a self-adaptive filter to a drifting process3US 7,424,392 B1Advanced Micro Devices, Inc. · 2008
- Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility2US 8,355,810 B2APPLIED Materials.Inc. · 2013
- Method for manufacturing semiconductor device1US 7,324,866 B2Matsushita Electric Industrial Co., Ltd. · 2008