Semiconductor fabrication component retuning

A system for retuning a parameter of a semiconductor fabrication component, comprising:

• a processing unit;
• and
• a non-transitory memory comprising instructions that when executed by the processing unit cause a tuning component:
• evaluate processing data associated with a semiconductor fabrication component to formulate performance indices;
• perform one or more fabrication process change simulations based upon the performance indices to generate a component operating behavior data structure;
• identify a first tuning value for a first parameter used by the semiconductor fabrication component based upon the component operating behavior data structure indicating the first tuning value satisfies an objective performance function for the semiconductor fabrication component;
• identify a second tuning value for a second parameter used by the semiconductor fabrication component based upon the component operating behavior data structure indicating the second tuning value satisfies the objective performance function for the semiconductor fabrication component;
• and
• retune the first parameter from a first current value for the first parameter to the first tuning value and the second parameter from a second current value to the second tuning value, wherein:
• the component operating behavior data structure comprises a characteristic surface for the first parameter and the second parameter;
• and
• the characteristic surface comprises a surface comprising a retuning point that correlates a selected retuning cost to a tuning parameter pairing value corresponding to the first tuning value for the first parameter and the second tuning value for the second parameter, the selected retuning cost describing the objective performance function.

A non-transitory computer readable medium comprising instructions which when executed at least in part via a processing unit perform a method for retuning a semiconductor fabrication component, comprising:

• evaluating processing data associated with a semiconductor fabrication component to formulate performance indices;
• performing one or more fabrication process change simulations based upon the performance indices to generate a component operating behavior data structure;
• identifying a tuning parameter pairing used by the semiconductor fabrication component, the tuning parameter pairing comprising a first parameter and a second parameter;
• identifying a tuning parameter pairing value for the tuning parameter pairing based upon the component operating behavior data structure indicating the tuning parameter pairing value satisfies an objective performance function for the semiconductor fabrication component;
• and
• retuning the semiconductor fabrication component based upon the tuning parameter pairing value, wherein:
• the component operating behavior data structure comprises a characteristic surface for the first parameter and the second parameter;
• and
• the characteristic surface comprises a surface comprising a retuning point that correlates a selected retuning cost to the tuning parameter pairing value, the tuning parameter pairing value corresponding to a first tuning value for the first parameter and a second tuning value for the second parameter, the selected retuning cost describing the objective performance function.