G05B 2219/32048
Wait state between two successive machining steps
G05B2219/32048 (Wait state between two successive machining steps) appears on 3 US grants and 2 published applications in this corpus.
Search patents in G05B- Granted patents
- 3
- Published applications
- 2
- Assignees
- 2
- Inventors
- 3
- Latest grant
- 21 Nov 2006
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 1 | 1 |
| 2005 | 0 | 0 |
| 2006 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method and system to compensate for scanner system timing variability in a semiconductor wafer fabrication system21 Nov 2006US 7,139,631 B2ASML Holding N. V.
- Method and apparatus for resolving conflicts in a substrate processing system27 Jul 2004US 6,768,930 B2ASML Holding N. V.
- Machining systems and control systems therefor25 Sep 1984US 4,473,883 AToshiba Kikai Kabushiki Kaiha
Most cited
By later US patents
- Machining systems and control systems therefor53US 4,473,883 AToshiba Kikai Kabushiki Kaiha · 1984
- Method and apparatus for resolving conflicts in a substrate processing system19US 6,768,930 B2ASML Holding N. V. · 2004
- Method and system to compensate for scanner system timing variability in a semiconductor wafer fabrication system2US 7,139,631 B2ASML Holding N. V. · 2006