G03H 2240/52
Exposure parameters
Official title: Exposure parameters, e.g. time, intensity
G03H2240/52 (Exposure parameters) appears on 45 US grants and 65 published applications in this corpus.
Search patents in G03H- Granted patents
- 45
- Published applications
- 65
- Assignees
- 48
- Inventors
- 155
- Latest grant
- 11 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
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| 1991 | 0 | 0 |
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| 1994 | 1 | 0 |
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| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 2 | 1 |
| 2003 | 1 | 0 |
| 2004 | 1 | 2 |
| 2005 | 0 | 0 |
| 2006 | 1 | 2 |
| 2007 | 0 | 9 |
| 2008 | 1 | 8 |
| 2009 | 1 | 2 |
| 2010 | 7 | 4 |
| 2011 | 6 | 2 |
| 2012 | 2 | 5 |
| 2013 | 2 | 1 |
| 2014 | 1 | 2 |
| 2015 | 0 | 2 |
| 2016 | 0 | 3 |
| 2017 | 1 | 1 |
| 2018 | 2 | 3 |
| 2019 | 1 | 0 |
| 2020 | 3 | 4 |
| 2021 | 1 | 4 |
| 2022 | 4 | 2 |
| 2023 | 2 | 3 |
| 2024 | 2 | 2 |
| 2025 | 2 | 0 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for holographic recording11 Nov 2025US 12,468,257 B2Kwangwoon University Industry-Academic Collaboration Foundation
- Optical combiner with uniform illuminance throughput21 Jan 2025US 12,204,136 B2Meta Platforms Technologies, LLC
- Hologram color printing method and apparatus using hologram medium light efficiency map3 Dec 2024US 12,158,727 B2Korea Electronics Technology Institute
- Method and apparatus for preparing femtosecond optical filament interference direct writing volume grating/chirped volume grating13 Feb 2024US 11,899,229 B2Chongqing Institute of East China Normal University
- Optically variable film, apparatus and method for making the same23 May 2023US 11,656,396 B2Illinois Tool Works Inc.
- Measurement method for determining a replication parameter, and replication method using the determined replication parameter20 Aug 2026US 2026/0244155 A1
- Exposure apparatus, exposure method, and method for manufacturing holographic optical element25 Jun 2026US 2026/0177452 A1Panasonic Intellectual Property Management Co., Ltd.
- Exposure apparatus, exposure method, and method for manufacturing holographic optical element25 Jun 2026US 2026/0177975 A1Panasonic Intellectual Property Management Co., Ltd.
- Method and apparatus for holographic recording6 Jun 2024US 2024/0184246 A1Kwangwoon University Industry-Academic Collaboration Foundation
- System and method for reducing scatter and crosstalk in self-developing holographic media21 Mar 2024US 2024/0094677 A1Vuzix Corporation
Most cited
By later US patents
- System and method for replicating volume holograms93US 6,730,442 B1Science Applications International Corporation · 2004
- In-line holographic mask for micromachining30US 6,618,174 B2Diffraction, LTD · 2003
- In-line holographic mask for micromachining30US 7,099,057 B2Marsupial Holdings, Inc. · 2006
- Multi-beam optical system for fast writing of data on glass20US 10,181,336 B1Microsoft Technology Licensing, LLC · 2019
- Low noise transmission holographic optical element18US 5,315,417 AHughes Aircraft Company · 1994