Exposure apparatus, exposure method, and method for manufacturing holographic optical element
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsWahei AGEMIZU, Taito MIWA
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AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsWahei AGEMIZU, Taito MIWA
Estimating the term…
To produce a holographic optical element with a set diffraction efficiency. An exposure apparatus used for exposing a volume hologram to light includes a laser light source that irradiates the volume hologram with first light which is light with a predetermined wavelength range in order to detect a first diffraction efficiency of the volume hologram during exposure, a power meter that detects the amount of first light, a power meter that detects the amount of second light which is the first light diffracted by the volume hologram, a prediction device that calculates the first diffraction efficiency based on detection results of the power meters and predicts a second diffraction efficiency which is the diffraction efficiency of the volume hologram after stop of the exposure according to the calculated first diffraction efficiency, and a control device that controls, according to a prediction result, an adjustment device that adjusts the amount of light from a laser light source that emits third light to which the volume hologram is to be exposed.
An exposure apparatus used for exposing a holographic optical element to light, comprising:
An exposure apparatus used for exposing a holographic optical element to light, comprising:
A method for exposing a holographic optical element to light, comprising:
A method for exposing a holographic optical element to light, comprising:
A method for manufacturing a holographic optical element, comprising:
A method for manufacturing a holographic optical element, comprising:
Dependencies are inferred from the claim text.