G03C 1/815
Characterised by means for filtering or absorbing ultraviolet light
Official title: characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching (for photoprinting G03C5/10; for intensifying X-ray images G03C5/17)
G03C1/815 (Characterised by means for filtering or absorbing ultraviolet light) appears on 238 US grants and 28 published applications in this corpus.
Search patents in G03C- Granted patents
- 238
- Published applications
- 28
- Assignees
- 33
- Inventors
- 338
- Latest grant
- 4 Jun 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 5 | 0 |
| 1978 | 4 | 0 |
| 1979 | 3 | 0 |
| 1980 | 9 | 0 |
| 1981 | 16 | 0 |
| 1982 | 7 | 0 |
| 1983 | 0 | 0 |
| 1984 | 5 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 3 | 0 |
| 1988 | 5 | 0 |
| 1989 | 8 | 0 |
| 1990 | 10 | 0 |
| 1991 | 6 | 0 |
| 1992 | 9 | 0 |
| 1993 | 8 | 0 |
| 1994 | 16 | 0 |
| 1995 | 7 | 0 |
| 1996 | 12 | 0 |
| 1997 | 15 | 0 |
| 1998 | 13 | 0 |
| 1999 | 15 | 0 |
| 2000 | 15 | 0 |
| 2001 | 9 | 1 |
| 2002 | 5 | 6 |
| 2003 | 7 | 6 |
| 2004 | 6 | 2 |
| 2005 | 3 | 3 |
| 2006 | 6 | 5 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 1 | 1 |
| 2011 | 0 | 1 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 1 |
| 2016 | 1 | 1 |
| 2017 | 0 | 1 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method4 Jun 2019US 10,310,377 B2Mitsubishi Gas Chemical Company, Inc.
- Conductive element precursor and conductive pattern formation16 Feb 2016US 9,261,787 B1Eastman Kodak Company
- Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole24 Apr 2012US 8,163,934 B2
- Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole7 Dec 2010US 7,847,103 B2
- Silver halide photographic light-sensitive material17 Oct 2006US 7,122,299 B2Fuji Photo Film Co., Ltd.
- Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method25 May 2017US 2017/0144954 A1Mitsubishi Gas Chemical Company, Inc.
- Conductive element precursor and conductive pattern formation3 Mar 2016US 2016/0062238 A1Eastman Kodak Company
- Laser markable film15 Oct 2015US 2015/0293437 A1Innovia Films Limited
- Ultraviolet light absorbing ketones of 2-(2-hydroxyhenyl) benzotriazole17 Feb 2011US 2011/0038816 A1
- Ultraviolet light absorbing ketones of 2-(2-Hydroxyphenyl) benzotriazole8 Apr 2010US 2010/0086500 A1
Most cited
By later US patents
- 2-(2-Hydroxyphenyl)-benztriazoles, their use as UV-absorbers and their preparation83US 4,853,471 ACiba-Geigy Corporation · 1989
- Water-soluble compounds as light stabilizers80US 5,096,781 ACiba-Geigy Corporation · 1992
- UV absorbers65US 5,489,503 ACiba-Geigy Corporation · 1996
- Latent light stabilizers65US 5,597,854 ACiba-Geigy Corporation · 1997
- Method of stabilizing organic substrates against the action of light64US 4,239,843 AFuji Photo Film Co., Ltd. · 1980