G02B 17/0892
Specially adapted for the uv
Official title: {specially adapted for the UV}
G02B17/0892 (Specially adapted for the uv) appears on 364 US grants and 315 published applications in this corpus.
Search patents in G02B- Granted patents
- 364
- Published applications
- 315
- Assignees
- 62
- Inventors
- 293
- Latest grant
- 11 Feb 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 5 | 0 |
| 1994 | 4 | 0 |
| 1995 | 1 | 0 |
| 1996 | 7 | 0 |
| 1997 | 10 | 0 |
| 1998 | 17 | 0 |
| 1999 | 8 | 0 |
| 2000 | 11 | 0 |
| 2001 | 7 | 5 |
| 2002 | 16 | 14 |
| 2003 | 18 | 19 |
| 2004 | 14 | 28 |
| 2005 | 16 | 29 |
| 2006 | 27 | 27 |
| 2007 | 19 | 16 |
| 2008 | 15 | 34 |
| 2009 | 13 | 20 |
| 2010 | 24 | 15 |
| 2011 | 12 | 9 |
| 2012 | 13 | 11 |
| 2013 | 11 | 9 |
| 2014 | 12 | 10 |
| 2015 | 6 | 13 |
| 2016 | 14 | 6 |
| 2017 | 8 | 10 |
| 2018 | 13 | 12 |
| 2019 | 4 | 6 |
| 2020 | 4 | 10 |
| 2021 | 9 | 3 |
| 2022 | 8 | 3 |
| 2023 | 2 | 1 |
| 2024 | 1 | 2 |
| 2025 | 1 | 1 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Stop, optical system and lithography apparatus11 Feb 2025US 12,222,655 B2Carl Zeiss SMT GmbH
- Illumination apparatus20 Aug 2024US 12,066,611 B2Optovate Limited
- Compact spectrometers and instruments including them4 Jul 2023US 11,692,873 B2PerkinElmer Health Sciences, Inc.
- Catadioptric lens and optical system comprising such a lens24 Jan 2023US 11,561,381 B2Carl Zeiss SMT GmbH
- Catadioptric lens and optical system comprising such a lens6 Dec 2022US 11,520,130 B2Carl Zeiss SMT GmbH
- Illumination optical system including temperature compensated aperture30 Apr 2026US 2026/0118621 A1Samsung Display Co., Ltd.
- Catadioptric objective lens30 Apr 2026US 2026/0118650 A1KYOCERA SOC Corporation
- Methods and devices for adjusting an image plane location on an offner elay29 May 2025US 2025/0172791 A1APPLIED Materials.Inc.
- Imaging system10 Oct 2024US 2024/0337819 A1AAC Optics Solutions Pte. Ltd.
- Euv illumination device and method for operating a microlithographic projection exposure apparatus designed for operation in the euv25 Jul 2024US 2024/0248410 A1
Most cited
By later US patents
- Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus256US 6,795,169 B2Nikon Corporation · 2004
- Catadioptric system for photolithography217US 5,835,275 ANikon Corporation · 1998
- Catadioptric optical system and exposure apparatus having the same200US 5,689,377 ANikon Corporation · 1997
- Catadioptric system and exposure apparatus having the same190US 5,668,672 ANikon Corporation · 1997
- Ultra-broadband UV microscope imaging system with wide range zoom capability168US 5,999,310 A1999