G02B 13/143
For use with ultraviolet radiation
Official title: {for use with ultraviolet radiation}
G02B13/143 (For use with ultraviolet radiation) appears on 301 US grants and 293 published applications in this corpus.
Search patents in G02B- Granted patents
- 301
- Published applications
- 293
- Assignees
- 104
- Inventors
- 455
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 8 | 0 |
| 1998 | 7 | 0 |
| 1999 | 9 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 3 |
| 2002 | 10 | 19 |
| 2003 | 16 | 25 |
| 2004 | 21 | 27 |
| 2005 | 22 | 29 |
| 2006 | 26 | 20 |
| 2007 | 16 | 29 |
| 2008 | 17 | 26 |
| 2009 | 9 | 8 |
| 2010 | 18 | 17 |
| 2011 | 9 | 8 |
| 2012 | 10 | 6 |
| 2013 | 13 | 8 |
| 2014 | 4 | 5 |
| 2015 | 5 | 11 |
| 2016 | 6 | 10 |
| 2017 | 8 | 4 |
| 2018 | 8 | 6 |
| 2019 | 6 | 3 |
| 2020 | 6 | 6 |
| 2021 | 2 | 0 |
| 2022 | 3 | 8 |
| 2023 | 1 | 3 |
| 2024 | 2 | 4 |
| 2025 | 6 | 5 |
| 2026 | 2 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for deposition of at least one layer, optical element and optical arrangement28 Jul 2026US 12,692,603 B2Carl Zeiss SMT GmbH
- Projection lens21 Jul 2026US 12,687,693 B2Young Optics Inc.
- Infrared band pass filter having Si:NH layers with refraction index greater than 3.52 Sep 2025US 12,405,412 B2Platinum Optics Technology Inc.
- Fixed-focus lens8 Jul 2025US 12,353,057 B2Young Optics Inc.
- Anti-reflective optical coatings and methods of forming the same24 Jun 2025US 12,339,421 B2Corning Incorporated
- Method for reworking an optical element, optical element and optical system25 Jun 2026US 2026/0177937 A1Carl Zeiss SMT GmbH
- Articles including a multilayer optical film and fluoropolymer layers, transfer articles, and methods of making same4 Jun 2026US 2026/0153657 A13M Innovative Properties Company
- Method for producing an optical imaging system for a microlithography apparatus12 Mar 2026US 2026/0072364 A1
- Chromatically corrected imaging illumination optical unit for use in a lithographic projection exposure apparatus6 Nov 2025US 2025/0341782 A1
- Lens assembly, a lens unit holder for a lens assembly and a method for providing a lens unit for the lens assembly4 Sep 2025US 2025/0277956 A1Deutsches Elektronen-Synchrotron DESY
Most cited
By later US patents
- Projection optical system and exposure apparatus having the projection optical system322US 6,633,365 B2Nikon Corporation · 2003
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- Broad spectrum ultraviolet catadioptric imaging system143US 5,717,518 AKLA Instruments Corporation · 1998
- Refractive projection objective for immersion lithography128US 6,891,596 B2Carl Zeiss SMT GmbH · 2005
- Optical system with polarization compensator123US 6,252,712 B1Carl-Zeiss-Stiftung · 2001