G01N 33/0024
A chemical reaction taking place or a gas being eliminated in one
Official title: {a chemical reaction taking place or a gas being eliminated in one or more channels}
G01N33/0024 (A chemical reaction taking place or a gas being eliminated in one) appears on 42 US grants and 39 published applications in this corpus.
Search patents in G01N- Granted patents
- 42
- Published applications
- 39
- Assignees
- 38
- Inventors
- 92
- Latest grant
- 10 Dec 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 1 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 1 | 0 |
| 2006 | 0 | 0 |
| 2007 | 1 | 2 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 3 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 1 | 2 |
| 2014 | 3 | 2 |
| 2015 | 1 | 0 |
| 2016 | 1 | 1 |
| 2017 | 0 | 4 |
| 2018 | 2 | 1 |
| 2019 | 2 | 3 |
| 2020 | 4 | 5 |
| 2021 | 1 | 3 |
| 2022 | 0 | 1 |
| 2023 | 3 | 3 |
| 2024 | 3 | 1 |
| 2025 | 0 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- System with substrate carrier deterioration detection and repair10 Dec 2024US 12,162,134 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Protective enclosure for gas sensors24 Sep 2024US 12,099,043 B2International Business Machines Corporation
- Method and system for generating interference spectra for low detection limits using reactor6 Aug 2024US 12,053,755 B2Mls Acq, Inc.
- Protective enclosure for gas sensors11 Apr 2023US 11,624,740 B2International Business Machines Corporation
- Substrate carrier deterioration detection and repair21 Feb 2023US 11,584,019 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate carrier deterioration detection and repair27 Mar 2025US 2025/0100161 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Chemical analysis process in gas phase30 Jan 2025US 2025/0035601 A1
- Method and system for generating interference spectra for low detection limits using reactor31 Oct 2024US 2024/0359153 A1MLS ACQ, Inc. D/B/A Max Analytical Technologies
- Gas analysis device and gas analysis method23 Nov 2023US 2023/0375503 A1Horiba, Ltd.
- Substrate carrier deterioration detection and repair22 Jun 2023US 2023/0191619 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method and apparatus for monitoring and measuring a gas42US 4,226,675 AComsip Delphi, Inc. · 1980
- Method and instrument for measuring differential oxygen concentration between two flowing gas streams36US 5,542,284 AQueen's University at Kingston · 1996
- Dual channel nitrogen oxides analyzer35US 3,967,933 AMonitor Labs, Inc. · 1976
- Method and apparatus for detecting a constituent in an atmosphere26US 3,997,297 A1976
- Detection of base contaminants in gas samples24US 6,207,460 B1Extraction Systems, Inc. · 2001