G01N 21/68
Using high frequency electric fields
Official title: using high frequency electric fields
G01N21/68 (Using high frequency electric fields) appears on 215 US grants and 212 published applications in this corpus.
Search patents in G01N- Granted patents
- 215
- Published applications
- 212
- Assignees
- 132
- Inventors
- 470
- Latest grant
- 21 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 4 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 6 | 0 |
| 1999 | 8 | 0 |
| 2000 | 5 | 0 |
| 2001 | 2 | 2 |
| 2002 | 1 | 4 |
| 2003 | 4 | 5 |
| 2004 | 7 | 8 |
| 2005 | 4 | 17 |
| 2006 | 10 | 13 |
| 2007 | 12 | 7 |
| 2008 | 6 | 6 |
| 2009 | 5 | 16 |
| 2010 | 10 | 6 |
| 2011 | 7 | 9 |
| 2012 | 6 | 6 |
| 2013 | 5 | 8 |
| 2014 | 9 | 6 |
| 2015 | 3 | 13 |
| 2016 | 8 | 7 |
| 2017 | 16 | 13 |
| 2018 | 11 | 13 |
| 2019 | 11 | 7 |
| 2020 | 11 | 11 |
| 2021 | 3 | 6 |
| 2022 | 3 | 10 |
| 2023 | 4 | 7 |
| 2024 | 6 | 6 |
| 2025 | 12 | 5 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Magnetic confinement of arc discharge migration in spark OES systems21 Oct 2025US 12,449,367 B2Thermo Electron Scientific Instruments LLC
- Plasma processing apparatus, plasma processing method and plasma processing analysis method14 Oct 2025US 12,442,770 B2Hitachi High-Tech Corporation
- System for prioritization of collecting and analyzing liquid samples14 Oct 2025US 12,442,828 B2Elemental Scientific, Inc.
- Chamber moisture control using narrow optical filters measuring emission lines23 Sep 2025US 12,422,357 B2APPLIED Materials.Inc.
- Plasma monitoring system, plasma monitoring method, and monitoring device23 Sep 2025US 12,424,424 B2Tokyo Electron Limited
- System and method for analyzing spectral data using artificial intelligence16 Jul 2026US 2026/0204364 A1Vionix Biosciences Inc.
- Optical emission spectroscopy for advanced process characterization11 Sep 2025US 2025/0283760 A1Tokyo Electron Limited
- Inductively coupled plasma torch with reverse vortex flow and method of operation11 Sep 2025US 2025/0283829 A1Standard BioTools Canada Inc.
- Inductively coupled plasma torch with reverse vortex flow and method of operation12 Jun 2025US 2025/0189455 A1Standard BioTools Canada Inc.
- Methods and devices for collecting and analyzing aerosol particles24 Apr 2025US 2025/0130140 A1
Most cited
By later US patents
- Plasma processing system and apparatus and a sample processing method269US 6,755,932 B2Hitachi, Ltd. · 2004
- Methods and apparatus for isotopic analysis79US 5,394,236 ARutgers, The State University · 1995
- Method and devices for detecting the end point of plasma process70US 5,980,767 ATokyo Electron Limited · 1999
- Dry etching endpoint detection system61US 6,207,008 B1Ricoh Company, Ltd. · 2001
- Method and devices for detecting the end point of plasma process54US 5,728,253 ATokyo Electron Limited · 1998