Plasma monitoring system, plasma monitoring method, and monitoring device
AssigneeTokyo Electron Limited
InventorsSatoru Teruuchi, Jun Hirose, Kazuya Nagaseki, Shinji Himori
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Abstract
A plasma monitoring system includes a monitoring device and a control device. The monitoring device is a device to be placed on a stage in the plasma processing apparatus. The monitoring device includes a plate-shaped base substrate, and a plurality of spectroscopes having optical axes facing upward on the base substrate, and being disposed apart from each other to acquire light emission intensities of the plasma. The control device acquires light emission intensity distribution data of the plasma in the plasma processing apparatus based on the light emission intensity acquired by each of the plurality of spectroscopes.
Claims18
A plasma monitoring system for measuring a light emission intensity of a plasma generated in a plasma processing apparatus, the system comprising:
- a monitoring device to be placed on a stage in the plasma processing apparatus, the monitoring device including a plate-shaped base substrate, and a plurality of spectroscopes having optical axes facing upward on the base substrate, and being disposed apart from each other to acquire light emission intensities of the plasma;
- and
- a control device for acquiring light emission intensity distribution data of the plasma in the plasma processing apparatus based on the light emission intensity acquired by each of the plurality of spectroscopes.
A plasma monitoring method of measuring a light emission intensity of a plasma generated in a plasma processing apparatus by using a monitoring device,
- in which the monitoring device includes
- a plate-shaped base substrate, and
- a plurality of spectroscopes having optical axes facing upward on the base substrate, and being disposed apart from each other, and
- the method comprising:
- placing the monitoring device on a stage in a chamber of the plasma processing apparatus;
- generating a plasma in the chamber of the plasma processing apparatus;
- acquiring light emission intensities of the plasma by the plurality of spectroscopes;
- and
- acquiring light emission intensity distribution data of the plasma in the plasma processing apparatus based on the light emission intensities acquired by the plurality of spectroscopes.
A monitoring device for measuring a light emission intensity of a plasma generated in a plasma processing apparatus, the device comprising:
- a plate-shaped base substrate placed on a stage in the plasma processing apparatus;
- a plurality of spectroscopes having optical axes facing upward on the base substrate, and being disposed apart from each other to acquire light emission intensities of the plasma;
- and
- a control device for acquiring light emission intensity distribution data of the plasma in the plasma processing apparatus based on the light emission intensity acquired by each of the plurality of spectroscopes.
Dependencies are inferred from the claim text.