G01N 2021/8848
Polarisation of light
Official title: {Polarisation of light}
G01N2021/8848 (Polarisation of light) appears on 296 US grants and 373 published applications in this corpus.
Search patents in G01N- Granted patents
- 296
- Published applications
- 373
- Assignees
- 156
- Inventors
- 773
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 3 |
| 2002 | 2 | 1 |
| 2003 | 3 | 1 |
| 2004 | 1 | 1 |
| 2005 | 1 | 5 |
| 2006 | 3 | 7 |
| 2007 | 1 | 4 |
| 2008 | 3 | 1 |
| 2009 | 5 | 3 |
| 2010 | 3 | 7 |
| 2011 | 3 | 3 |
| 2012 | 1 | 4 |
| 2013 | 8 | 8 |
| 2014 | 3 | 13 |
| 2015 | 13 | 25 |
| 2016 | 14 | 24 |
| 2017 | 27 | 23 |
| 2018 | 22 | 29 |
| 2019 | 23 | 19 |
| 2020 | 21 | 27 |
| 2021 | 28 | 25 |
| 2022 | 14 | 23 |
| 2023 | 14 | 33 |
| 2024 | 15 | 34 |
| 2025 | 39 | 27 |
| 2026 | 25 | 23 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for inspecting for surface defects on a cast part made of single-crystal metal and system for implementing same29 Sep 2026US 12,748,054 B2Safran
- Imaging system and imaging inspection apparatus including the same22 Sep 2026US 12,742,737 B2Postech Research and Business Development Foundation
- Defect inspection device8 Sep 2026US 12,730,065 B2Hitachi High-Tech Corporation
- Second harmonic generation (SHG) measurement device and measurement method using the same1 Sep 2026US 12,723,863 B2Samsung Electronics Co., Ltd.
- Optical inspection system of eliminating image noise1 Sep 2026US 12,723,988 B2Gudeng Equipment Co., Ltd.
- Photodetector inspection apparatus and photodetector inspection method8 Oct 2026US 2026/0309579 A1Mitsubishi Electric Corporation
- Dark field defect inspection system and inspection method thereof8 Oct 2026US 2026/0309637 A1Samsung Electronics Co., Ltd.
- Inspection systems, devices, and methods using polarized light8 Oct 2026US 2026/0309644 A1General Electric Company
- Multiple Azimuth, Multiple Pass Optical Measurements Of Semiconductor Structures1 Oct 2026US 2026/0298807 A1
- Optical inspection apparatus, optical inspection system, optical inspection method, and non-transitory storage medium storing optical inspection program10 Sep 2026US 2026/0266734 A1Kabushiki Kaisha Toshiba
Most cited
By later US patents
- Sample inspection system235US 6,201,601 B1KLA-Tencor Corporation · 2001
- Sample inspection system46US 6,639,662 B2KLA-Tencor Corporation · 2003
- Method and apparatus for auto-adjusting illumination40US 7,557,920 B22009
- Sample inspection system32US 6,384,910 B2KLA-Tencor Corporation · 2002
- System and method for inspecting a workpiece surface using surface structure spatial frequencies26US 7,286,218 B2KLA-Tencor Technologies Corporation · 2007