F04C 2220/30
Use in a chemical vapor deposition [cvd] process or in a similar
Official title: Use in a chemical vapor deposition [CVD] process or in a similar process
F04C2220/30 (Use in a chemical vapor deposition [cvd] process or in a similar) appears on 33 US grants and 58 published applications in this corpus.
Search patents in F04C- Granted patents
- 33
- Published applications
- 58
- Assignees
- 26
- Inventors
- 114
- Latest grant
- 17 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 3 |
| 2005 | 1 | 2 |
| 2006 | 1 | 2 |
| 2007 | 1 | 3 |
| 2008 | 0 | 2 |
| 2009 | 1 | 3 |
| 2010 | 4 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 2 |
| 2013 | 1 | 6 |
| 2014 | 0 | 5 |
| 2015 | 1 | 6 |
| 2016 | 1 | 0 |
| 2017 | 4 | 2 |
| 2018 | 0 | 2 |
| 2019 | 2 | 0 |
| 2020 | 0 | 3 |
| 2021 | 2 | 2 |
| 2022 | 2 | 3 |
| 2023 | 0 | 4 |
| 2024 | 6 | 4 |
| 2025 | 3 | 2 |
| 2026 | 1 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Information processing apparatus, information processing system, information processing method, program, substrate processing apparatus, criterion data determination apparatus, and criterion data determination method17 Mar 2026US 12,577,952 B2Ebara Corporation
- Vacuum line and method for controlling a vacuum line to reduce explosion potential via injection of diluent gas to lower flammable gas concentration16 Dec 2025US 12,496,563 B2Pfeiffer Vacuum GmbH
- Product removal apparatus, treatment system, and product removal method19 Aug 2025US 12,394,609 B2Ebara Corporation
- Stator for a vacuum pump1 Jul 2025US 12,345,261 B2Edwards Limited
- System and method for treating exhaust fluid from semiconductor manufacturing equipment31 Dec 2024US 12,179,147 B2Plan Co., Ltd
- Vacuum pump20 Aug 2026US 2026/0243257 A1Pfeiffer Vacuum GmbH
- Vacuum exhaust system and cleaning method5 Mar 2026US 2026/0062800 A1Edwards Japan Limited
- Fluid routing for a vacuum pumping system21 Aug 2025US 2025/0266268 A1Edwards Limited
- Chemical vapor deposition apparatus26 Jun 2025US 2025/0207256 A1
- Stator for a vacuum pump4 Jul 2024US 2024/0218877 A1Edwards Limited
Most cited
By later US patents
- Fluid pump17US 7,255,541 B2Kabushiki Kaisha Toyota Jidoshokki · 2007
- Tool locking mechanism16US 6,868,760 B1Pratt-Read Corporation · 2005
- Apparatus for controlling the pressure in a process chamber and method of operating same9US 7,814,922 B2Edwards Limited · 2010
- Vacuum pumping apparatus8US 6,471,494 B1Aisin Seiki Kabushiki Kaisha · 2002
- Reclaim function for semiconductor processing systems6US 8,235,580 B2Air Liquide Electronics U.S. LP · 2012